Photoresist resin solution, preparation method and preservation method thereof

A resin solution and photoresist technology, applied in the field of photoresist materials, can solve the problems of poor storage stability of photoresist resin, and achieve the effect of improving storage stability

Inactive Publication Date: 2019-03-01
CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0018] The main purpose of the present invention is to provide a photoresist resin solution, its preparation method and preservation method, to solve the problem of poor storage stability of photoresist resin in the prior art

Method used

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  • Photoresist resin solution, preparation method and preservation method thereof
  • Photoresist resin solution, preparation method and preservation method thereof
  • Photoresist resin solution, preparation method and preservation method thereof

Examples

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preparation example Construction

[0047] In another typical embodiment of the present application, a method for preparing any one of the above-mentioned photoresist resin solutions is provided, the preparation method includes: mixing the solvent and the photoresist resin at 20-30°C A stabilizer and an optional diluent are added to the liquid, and the mixture is stirred at a speed of 100-300 rpm for 1-5 hours to obtain a photoresist resin solution. The above-mentioned photoresist resin solution can be obtained by stirring and mixing at room temperature, and the preparation method is simple, which is beneficial to popularization and application of the photoresist resin solution of the present application.

[0048] In yet another typical implementation manner of the present application, a method for storing any one of the above-mentioned photoresist resin solutions is provided, and the photoresist resin solution is stored at -10-5°C. The photoresist resin solution added with a stabilizer in this application can h...

Embodiment 1

[0051] The structural formula of photoresist resin is:

[0052]

[0053] In the formula, R 1 , R 2 , R 3 and R 4 Each independently represents a hydrogen atom; R 5 Represents methyl; A represents 9,9-fluorenyl; X represents biphenyl; Y 1 and Y 2 Each independently represents -OC-(COOH)m saturated carboxylic acid group, wherein m=1, n is any integer from 1 to 20. Accurately weigh 200 g of the photoresist resin solution (solid content: 49.96%), put it in a 250 ml four-necked flask, add 0.04 g of polymerization inhibitor MTBHQ at room temperature (25° C.), and at room temperature at a speed of 150 rpm Stir for 2 hours to fully mix the MTBHQ and the photoresist resin. After the stirring is completed, seal the photoresist resin solution mixed with the polymerization inhibitor. Accurately weigh 0.5g of the above-mentioned photoresist resin solution mixed with a polymerization inhibitor, dilute it with propylene glycol methyl ether acetate (PGMEA) to a photoresist resin dil...

Embodiment 2

[0055] Accurately weigh 200 g of the photoresist resin solution (solid content: 49.96%) in Example 1, put in a 250 ml four-necked flask, add 0.10 g of polymerization inhibitor MTBHQ at room temperature (25° C.), and rotate at 150 rpm at room temperature Stir for 2 hours at a speed of 1 / min to fully mix the MTBHQ and the photoresist resin. After the stirring is completed, seal the photoresist resin solution mixed with the polymerization inhibitor. Accurately weigh 0.5g of the above-mentioned photoresist resin solution mixed with a polymerization inhibitor, dilute it with propylene glycol methyl ether acetate (PGMEA) to a photoresist resin dilution of 2.0% solid content, seal the photoresist resin dilution, Number 2#.

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Abstract

The invention provides a photoresist resin solution, a preparation method and a preservation method thereof. The photoresist resin solution comprises a solvent and photoresist resin, and the photoresist resin solution further comprises a stabilizer, wherein the stabilizer is an antioxidant or a polymerization inhibitor. A stabilizing effect is achieved by applying the antioxidant or the polymerization inhibitor as the stabilizer to the photoresist resin solution, so that the preservation stability of the photoresist solution is improved. At the same time, the presence of the stabilizer does not adversely affect the etching accuracy of the subsequent photoresist resin used as a photoresist, and therefore, the stabilizer does not need to be separated during the application of the photoresistresin, namely, no unnecessary trouble is caused to the application of the photoresist resin.

Description

technical field [0001] The invention relates to the field of photoresist materials, in particular to a photoresist resin solution, a preparation method and a preservation method thereof. Background technique [0002] Photoresist resin is an important raw material for preparing photoresist. Photoresist is widely used in liquid crystal display, flat panel display and other industries, and its quality directly determines the display effect of the display. The stability and other characteristics of the photoresist resin directly determine the application effect of the photoresist. Currently commercially available photoresist resins do not have a particularly good diluent stability. Therefore, how to improve the storage stability of the photoresist resin and thereby improve the stability of the photoresist is very important. [0003] For the resin used in the test, its structure represents the following formula a: [0004] [0005] Where: R 1 , R 2 , R 3 , R 4 Each inde...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/038
CPCG03F7/004G03F7/038
Inventor 钱晓春胡春青葛庆余
Owner CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS
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