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Pellicle member frame and pellicle member

A pellicle and component technology, applied in the field of pellicle component frames and pellicle components, can solve the problems of size, quality, appearance damage, rough edges, and black base, and achieve the effect of excellent appearance

Pending Publication Date: 2019-02-26
SHIN ETSU CHEM IND CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the manufacture of semiconductors such as LSI and super LSI, and the manufacture of liquid crystal displays, semiconductor wafers and original plates for liquid crystals are irradiated with light to form patterns. However, if the photomask or reticle (hereinafter referred to as Dust attached to the photomask) will cause the following problems: rough edges, black background, etc., resulting in damage to size, quality, and appearance

Method used

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  • Pellicle member frame and pellicle member
  • Pellicle member frame and pellicle member
  • Pellicle member frame and pellicle member

Examples

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Effect test

Embodiment 1

[0120] Hereinafter, an Example is shown and this invention is demonstrated more concretely.

[0121] Figure 8 , Figure 9 shows the use of figure 1 , figure 2 , image 3 and Figure 4 Perspective and cross-sectional views of the membrane member fabricated from the membrane member frame shown.

[0122] The surface member frame 11 is manufactured by machining using 5000 series aluminum alloy, and is treated with a black aluminum oxide film. At this time, the dimensions of the membrane member frame 11 are: the outer dimension is 756×937.5 mm, the inner dimension is 740×925.5 mm, and the height is 5.8 mm. On the surface (film bonding surface) 12 where the film is set, an inclined surface 12a that descends from the inner edge side to the outer edge side is provided on the entire circumference, from the outer edge side terminal b of the inclined surface 12a to the edge where the film is set. The outer edge of the surface is formed with a flat surface 12b.

[0123] The wid...

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Abstract

An object of the present invention to provide a pellicle member frame capable of preventing a pellicle from being tightened due to the fact that an inner edge portion of an adhesive layer on the pellicle member frame is a curved surface when viewed from a cross section, and a pellicle member having a pellicle with an excellent appearance and without tightening. The present invention relates to a frame-shaped pellicle member frame which is arranged on a surface of the pellicle and has an inclined surface that descends from an inner edge side to an outer edge side, wherein a flat surface is arranged from an outer edge side end of the inclined surface to an outer edge of a surface provided with a pellicle. Further, the present invention provides a pellicle member, wherein an adhesive layer isarranged on the inclined surface and the flat surface on a surface provided with the pellicle on the pellicle member frame, and the pellicle is arranged on the adhesive layer.

Description

technical field [0001] The present invention relates to a pellicle frame and a pellicle for dust prevention when manufacturing semiconductor devices, liquid crystal displays, organic EL displays, and the like. Background technique [0002] In the manufacture of semiconductors such as LSI and super LSI, and the manufacture of liquid crystal displays, semiconductor wafers and original plates for liquid crystals are irradiated with light to form patterns. However, if the photomask or reticle (hereinafter referred to as Dust attached to the photomask) will cause the following problems: rough edges, blackened base, etc., resulting in damage to size, quality, and appearance. [0003] Therefore, these operations are usually carried out in a clean room, but even so, it is difficult to keep the photomask always clean, so a dust-proof pellicle is attached to the surface of the photomask before exposure. In this case, the foreign matter does not directly adhere to the surface of the p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/64G03F1/62
CPCG03F1/62G03F1/64
Inventor 关原一敏
Owner SHIN ETSU CHEM IND CO LTD
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