Simulation method for double-base disk type involute sample plate measurement optical system based on heterodyne interference

An optical system, heterodyne interference technology, applied in the field of ZEMAX simulation, can solve the problems affecting system measurement accuracy, optical component placement error, non-ideal optical components, etc., to achieve the effect of optical system model optimization

Active Publication Date: 2019-01-18
BEIJING UNIV OF TECH
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Problems solved by technology

At the same time, for the optical system, there are error factors such as non-ideal optical components and placement errors of optical components, which affect the measurement accuracy of the system.

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  • Simulation method for double-base disk type involute sample plate measurement optical system based on heterodyne interference
  • Simulation method for double-base disk type involute sample plate measurement optical system based on heterodyne interference
  • Simulation method for double-base disk type involute sample plate measurement optical system based on heterodyne interference

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Embodiment Construction

[0044] The present invention will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. figure 2 It is a flow chart of system simulation using ZEMAX software, and its specific implementation process and result analysis process are as follows:

[0045] Step 1: Set the double-base disc involute model for laser heterodyne interference with three optical paths to measure the optical system parameters with high precision, namely wavelength and aperture. According to the system requirements, the frequencies are selected as f 1 and f 2 , The aperture of the light is selected as 20mm.

[0046] Step 2: Modeling in ZEMAX using non-sequential and sequential ray tracing modes to realize the first beam splitter BS 1 modeling simulation. Enter parameters in the data editing column in ZEMAX: BS 1 The radius of curvature, thickness and glass material. In non-sequential mode, model building of the geometry is done. Set the film lay...

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Abstract

The invention discloses a simulation method for a double-base disk type involute sample plate measurement optical system based on heterodyne interference. The method comprises the following steps of firstly, analyzing a principle of the double-base disk type involute sample plate measurement optical system based on the direct-reflection three-light path laser heterodyne interference; then buildingan energy simulation model of the double-base disk type involute sample plate measurement system based on the direct-reflection three-light path laser heterodyne interference by utilizing ZEMAX according to the principle of the optical system; and analyzing the influence of the non-ideal performance of each optical element in the optical system on the energy of a laser heterodyne interference signal by utilizing the energy simulation model. According to the method, the bottleneck of a double-base disk type involute sample plate sub-micron precision measurement technology is broken through; anew measurement model is built; and the influence of the non-ideal performance of each optical element on the energy of the measurement system is analyzed. The method has the guiding significance fordesigning the double-base disk type involute sample plate high-precision measurement optical system based on the direct-reflection three-light path laser heterodyne interference, selecting the opticalelements and improving the precision of the measurement system.

Description

technical field [0001] The invention relates to a ZEMAX simulation method, in particular to the ZEMAX simulation method of a double-base disc type involute model high-precision measurement system based on straight-reflection three-optical-path laser heterodyne interference, and belongs to the field of precision measurement. Background technique [0002] In order to realize the precision control of gears, it is very important to ensure the measurement accuracy of high-precision gear measuring instruments. Involute templates in the submicron range form the basis for the calibration of gear measuring instruments. However, for high-precision involute samples, how to use advanced laser measurement technology to improve the measurement accuracy of involute samples has not been resolved. Exploring the new principles and methods of measuring the involute model is the most cutting-edge research problem of gear measurement. [0003] The high-precision measurement of the involute sam...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/02G01B11/24
CPCG01B9/02048G01B11/2416
Inventor 陈洪芳汤亮石照耀姜博宋辉旭
Owner BEIJING UNIV OF TECH
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