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Digital camouflage pattern mosaic method based on texture synthesis and optimal stitching

An optimal stitching line and texture synthesis technology, applied in image enhancement, image analysis, graphic image conversion and other directions, can solve problems such as obvious seams, and achieve the effect of eliminating stitching gaps, eliminating straight line gaps, and having strong versatility.

Active Publication Date: 2019-01-04
XIAN TECHNOLOGICAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to provide a digital camouflage pattern splicing method based on texture synthesis and optimal suture lines, which solves the obvious problem of seams existing in existing digital camouflage splicing, so as to improve the camouflage performance of digital camouflage camouflage targets

Method used

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  • Digital camouflage pattern mosaic method based on texture synthesis and optimal stitching
  • Digital camouflage pattern mosaic method based on texture synthesis and optimal stitching
  • Digital camouflage pattern mosaic method based on texture synthesis and optimal stitching

Examples

Experimental program
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Effect test

Embodiment

[0035] Step 1. Use the DJI Phantom 4 drone to take aerial photos of the ocean background. The height and distance of the aerial photography are about 0-100 meters, the angle of incidence is not greater than 45°, the direction of the aerial photography is within 30° to the left and right of the light direction, and the height of the sun The angle is greater than 30°, the atmospheric visibility is more than 10 kilometers, and the picture has no exposure and noise; based on "Research on the Generation Algorithm of Digital Camouflage" (Yu Jun, Yang Wuxia, Hu Zhiyi, etc. Optoelectronic Engineering, 2010,37(11):110- 114.) principle, use Matlab software and original background photos to design and generate digital camouflage pattern A (resolution 286×184), aerial background photos are as follows image 3 (a) The digital camouflage patterns shown and generated are as follows image 3 (b) shown.

[0036] Step 2. Use the texture synthesis technology and Matlab software in "Tile Texture...

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Abstract

The invention provides a method for splicing digital camouflage patterns based on texture synthesis and optimum stitching thread which can generate large-size patterns with consistent texture and natural transition by using texture synthesis technology. The artificially created overlapping region is taken from the pattern generated by texture synthesis technology, which makes the original linear seam be replaced by the overlapping region directly, thus eliminating the linear gap. At the same time, the best stitching line tries to find a path to minimize the difference between the two sides ofthe gap, so that the stitching pattern can smoothly transition between the two sides of the stitching line as far as possible. The algorithm of the invention can better eliminate the splicing gap, does not change the size of the splicing pattern, and has stronger universality.

Description

technical field [0001] The invention belongs to the cross technical field of computer technology and military engineering camouflage technology, and specifically relates to a digital camouflage pattern splicing method based on texture synthesis and optimal suture lines, which can be used to eliminate seams produced by digital camouflage pattern splicing. Background technique [0002] As a camouflage style that has developed rapidly in recent years, digital camouflage has been widely used in the field of military camouflage. Digital camouflage uses the principle of spatial color mixing and patch characteristics to make the boundary between the camouflaged target and the background more fragmented and blurred, and the camouflage effect is better than traditional camouflage patterns. Usually, the digital camouflage pattern generated according to the natural background of the camouflaged target is a two-dimensional image with a fixed size. When applied to the actual camouflaged ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06T3/40G06T5/00
CPCG06T3/4038G06T2207/20221G06T5/77
Inventor 喻钧胡志毅李中华马龙姚红革王亚文初苗康秦瑀高守义廉志超张云辉
Owner XIAN TECHNOLOGICAL UNIV
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