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A method for optimally adjusting water film thickness in supercritical water oxidation evaporation wall reactor

A technology of supercritical water oxidation and water film thickness, applied in chemical instruments and methods, oxidized water/sewage treatment, water/sludge/sewage treatment, etc. , water film formation and damage, etc., to achieve the effect of optimizing water film formation, increasing water film thickness, and improving water film quality

Active Publication Date: 2020-07-28
XI AN JIAOTONG UNIV +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] The upper part of the supercritical water oxidation evaporation wall reactor is the main area of ​​the oxidation reaction, and the upper part is a supercritical environment of high temperature and high pressure; the high temperature and high pressure conditions in the upper supercritical region and the existence of violent chemical reactions make the convection between the main fluid and the water film Diffusion and mixing are extremely strong, which destroys the formation of water film; in addition, when the coupling relationship between the selected operating parameters is not appropriate, the thickness of the entire reactor will be reduced and the water film will be discontinuous

Method used

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  • A method for optimally adjusting water film thickness in supercritical water oxidation evaporation wall reactor
  • A method for optimally adjusting water film thickness in supercritical water oxidation evaporation wall reactor

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Embodiment Construction

[0035] see figure 1 As shown, the present invention is a system for adjusting the water film coverage of supercritical water oxidation evaporation wall reactor, including evaporation wall water pump 1, gas booster pump 2, material pump 3, electric heater 4, supercritical water Oxidation evaporation wall reactor, cooler 8, manual pressure regulating valve 9, gas-liquid separator 10, blowdown tank 11 and blowdown tank 12.

[0036] The supercritical water oxidation evaporation wall reactor is cylindrical, including an external pressure-bearing wall 5, and a cylindrical porous evaporation wall 6 is arranged inside the external pressure-bearing wall 5; an annular space is formed in the porous evaporation wall 6 for supercritical water oxidation reaction zone.

[0037] The outlet of the evaporating wall water pump 1 is connected to the water inlet of the porous evaporating wall 6 through a pipeline; the outlet of the gas booster pump 2 and the material pump 3 is connected to the in...

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Abstract

The invention discloses a method for optimally regulating the thickness of a water film of a supercritical water oxidation and evaporation wall type reactor. The method is based on a system for adjusting the coverage rate of the water film of the supercritical water oxidation and evaporation wall type reactor. The system comprises an outer pressure bearing wall. A barrel-shaped porous evaporationwall is arranged in the outer pressure bearing wall. An outlet of an evaporation wall water pump is connected with a water inlet of the porous evaporation wall through a pipeline. Outlets of a gas booster pump and a material pump are connected with an inlet of the supercritical water oxidation and evaporation wall type reactor through pipelines. The porous evaporation wall is of a conical structure. The thickness of the porous evaporation wall is gradually increased from top to bottom. The section of the porous evaporation wall is a right trapezoid. The method includes the steps that the thickness of the water film is adjusted by adjusting the evaporation intensity, the concentration of organic raw materials, the preheating temperature of the organic raw materials, the evaporation water inlet temperature and branch evaporation wall water flow proportions. The method can be applied to optimally adjusting performance parameters of the water film of the supercritical water oxidation and evaporation wall type reactor.

Description

technical field [0001] The invention relates to the technical field of supercritical water oxidation evaporation wall reactors, in particular to a method for optimally adjusting the water film thickness of supercritical water oxidation evaporation wall reactors. Background technique [0002] Supercritical water oxidation technology is a very valuable organic pollutant treatment technology. It uses supercritical water to dissolve organic substances and oxidants, so that organic substances can undergo a homogeneous reaction in an oxygen-enriched environment, thereby quickly and thoroughly Convert organic matter into harmless substances such as carbon dioxide and water, as well as inorganic salts. [0003] The application of supercritical water oxidation technology to highly toxic, high-concentration, and biodegradable organic waste has the following advantages: fast reaction speed, high treatment efficiency, no formation of secondary pollutants, no need for high-energy drying ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C02F1/72C02F101/30
CPCC02F1/72C02F2101/30
Inventor 徐东海汪洋郭树炜柳亮梁钰
Owner XI AN JIAOTONG UNIV
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