A method for optimally adjusting water film thickness in supercritical water oxidation evaporation wall reactor
A technology of supercritical water oxidation and water film thickness, applied in chemical instruments and methods, oxidized water/sewage treatment, water/sludge/sewage treatment, etc. , water film formation and damage, etc., to achieve the effect of optimizing water film formation, increasing water film thickness, and improving water film quality
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[0035] see figure 1 As shown, the present invention is a system for adjusting the water film coverage of supercritical water oxidation evaporation wall reactor, including evaporation wall water pump 1, gas booster pump 2, material pump 3, electric heater 4, supercritical water Oxidation evaporation wall reactor, cooler 8, manual pressure regulating valve 9, gas-liquid separator 10, blowdown tank 11 and blowdown tank 12.
[0036] The supercritical water oxidation evaporation wall reactor is cylindrical, including an external pressure-bearing wall 5, and a cylindrical porous evaporation wall 6 is arranged inside the external pressure-bearing wall 5; an annular space is formed in the porous evaporation wall 6 for supercritical water oxidation reaction zone.
[0037] The outlet of the evaporating wall water pump 1 is connected to the water inlet of the porous evaporating wall 6 through a pipeline; the outlet of the gas booster pump 2 and the material pump 3 is connected to the in...
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