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Preparation method of OLED device

A manufacturing method and device technology, applied in the field of OLED display, can solve the problems affecting the display, clogging of the nozzle of the printing equipment, short circuit of the device, etc., and achieve the effects of ensuring the uniformity of film formation, facilitating stable storage, and improving the uniformity of film formation.

Inactive Publication Date: 2018-12-07
GUANGDONG JUHUA PRINTING DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The micron particles in the silver glue may scratch or pierce the organic functional layer, causing short-circuit defects of the device; the silver glue particles are large in size and uneven in particle size, which may easily cause blockage of the nozzle of the printing equipment, affect the printing effect and cause damage to the nozzle; The accumulation of silver colloidal particles is loose and unevenly dispersed. After drying, it is easy to cause line breakage and non-conduction and device Mura phenomenon, which affects the display.
In contrast, although nanoparticle-based conductive ink has been greatly improved, due to the large specific surface area and high surface energy of nanoparticles, agglomeration between particles is easy to occur. In the inkjet printing process, the nozzle is very small and easy to Clogging occurs, so inkjet printing nanoparticle dispersion is also a challenge to the nozzle; and nanoparticles are easy to aggregate, which is not conducive to the stable storage of ink

Method used

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  • Preparation method of OLED device
  • Preparation method of OLED device

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preparation example Construction

[0043] The preparation method of the silver ink is as follows: under the condition of an ice-water bath (the temperature can be -5°C to 10°C), mix and stir the metal silver salt, complexing agent, initiator, and solvent until they are completely dissolved, and filter to obtain the silver ink ; Wherein, the mass fraction of the metal silver salt is 5%-30%, the mass fraction of the complexing agent is 5%-30%, and the mass fraction of the Marangoni flow initiator is 5%-20% , the mass fraction of the solvent is 40%-70%.

[0044] It can be understood that in the preparation method of the above silver ink, an auxiliary agent may also be added, and the mass fraction of the auxiliary agent is not higher than 5%.

[0045]In the silver ink system, metal silver salt and complexing agent can form silver ammonia complex. The metal silver salt is selected from one or more of silver citrate, silver malate, silver tartrate, silver acetate, silver oxalate and silver formate; the complexing ag...

Embodiment 1

[0073] This embodiment provides a method for manufacturing an OLED device, comprising the following steps:

[0074] Obtain a glass substrate, and form an anode ITO on the substrate;

[0075] stacking a hole injection layer, a hole transport layer, a light-emitting layer, and a buffer layer sequentially on the anode;

[0076] The material of the buffer layer is made of epoxy resin and PFNR 2 Prepared according to the mass ratio of 10:1.

[0077] Ink-jet printing silver ink on the buffer layer to form an ink liquid film;

[0078] The preparation method of silver ink is:

[0079] In an ice-water bath environment, mix and stir 7g of silver acetate, 8g of ethanolamine, 37g of ethanol, 25g of isopropanol, 1g of glacial acetic acid, 2g of polyvinylpyrrolidone and 20g of ethylene glycol until completely dissolved, and filter to obtain silver ink;

[0080] Ink-jet printing the above-mentioned silver ink on the above-mentioned buffer layer to form an ink liquid film;

[0081] Carry...

Embodiment 2

[0086] This embodiment provides a method for manufacturing an OLED device, comprising the following steps:

[0087] Obtain a glass substrate, and form an anode ITO on the substrate;

[0088] stacking a hole injection layer, a hole transport layer, a light-emitting layer, and a buffer layer sequentially on the anode;

[0089] The material of the buffer layer is made of epoxy resin and PFNR 2 Prepared according to the mass ratio of 10:1.

[0090] Ink-jet printing silver ink on the buffer layer to form an ink liquid film;

[0091] The preparation method of silver ink is:

[0092] In an ice-water bath environment, mix and stir 10g of silver citrate, 20g of ammonia water, 20g of deionized water, 30g of isopropanol, 5g of glacial acetic acid and 15g of ethylene glycol until completely dissolved, and filter to obtain silver ink.

[0093] Ink-jet printing the silver ink on the buffer layer to form an ink liquid film;

[0094] Carry out vacuum drying to described ink liquid film, ...

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Abstract

The present invention relates to a preparation method of an OLED device. The method comprises the following steps of: obtaining a substrate, and forming an anode on the substrate; forming an organic function layer on the anode; performing ink-jet printing of silver ink on the organic function layer to form an ink liquid film; performing vacuum drying of the ink liquid film; performing uv drying ofthe ink liquid film after vacuum drying; and performing sintering of the ink liquid film after uv drying to form a cathode and obtain an OLED device. The ink has better film formation uniformity andthe ink is convenient to stably store so as to have an important meaning for the stability of the device.

Description

technical field [0001] The invention relates to the field of OLED display, in particular to a preparation method of an OLED device. Background technique [0002] The traditional OLED device structure is divided into substrate, ITO anode layer, hole injection layer, hole transport layer, light emitting layer, electron transport layer, electron injection layer and cathode layer. Among them, the cathode layer is a metal with low work function, such as Ag, Mg, Al, etc. The preparation process of this layer is: on the device after depositing each organic functional layer, the cathode material of solid block, strip or filament is used The vacuum thermal evaporation method is used to accurately vapor-deposit the device structure through the metal mask, so as to realize the patterned deposition of the cathode. The vacuum evaporation process has high requirements on the equipment and its stability, and requires a mask, which increases the complexity of the process. The material wast...

Claims

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Application Information

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IPC IPC(8): H01L51/52H01L51/56
CPCH10K50/82H10K71/00
Inventor 韩平
Owner GUANGDONG JUHUA PRINTING DISPLAY TECH CO LTD
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