Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device and method for simultaneously measuring beam intensity and beam emittance

A technology of beam intensity and emittance, which is applied in measuring devices, radiation measurement, X/γ/cosmic radiation measurement, etc., can solve the problems of high cost and large space occupation, and achieve compact structure, simple operation, and measurement principle and data processing method simple effect

Inactive Publication Date: 2018-11-23
NORTHWEST INST OF NUCLEAR TECH
View PDF6 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to solve the problems of large space occupation and high cost caused by using traditional measuring devices to measure the beam intensity and emittance parameters separately, the present invention provides a composite beam that can simultaneously measure the intensity of the high-current proton beam and the emittance of the beam Device and method for measuring flow parameters

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device and method for simultaneously measuring beam intensity and beam emittance
  • Device and method for simultaneously measuring beam intensity and beam emittance
  • Device and method for simultaneously measuring beam intensity and beam emittance

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0046] In order to make the objectives, technical solutions, and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be noted that the following X-direction and Y-direction are horizontal and vertical directions respectively;

[0047] From figure 2 It can be seen that the measurement device in this embodiment mainly includes: X-direction position sampling slit plate 21, Y-direction position sampling slit plate 23, X-direction angle sampling slit plate 22, Y-direction angle sampling slit plate 24 and a set of vacuum system. The vacuum system includes a vacuum chamber 25 and a driving device. The X-position sampling slit plate 21, the Y-position sampling slit plate 23, the X-direction angle sampling slit plate 22, and the Y-direction angle sampling slit plate 24 are all located inside the vacuum chamber 25, and X The position sampling slit plate 21 and th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a device and method for simultaneously measuring beam intensity and beam emittance. The device mainly comprises position sampling slit plates in a horizontal direction and a vertical direction, angle sampling slit plates in a horizontal direction and a vertical direction, and a vacuum system. During the measurement of beam intensity, the intensity of an incident particle beam is obtained according to the sum of the currents received by Faraday cylinders at the position sampling slit plates, the angle sampling slit plates and Faraday cylinders behind the angle samplingslit plates. During the measurement of beam emittance, the position and the divergence angle of the beam are sampled under the driving of a motor, and the beam emittance is measured by measuring the positions of the two slit plates and a current signal received by the angle sampling slit plates. The device is compact in structure, easy to operate and easy to miniaturize, can measure the emittanceof the beam in both the horizontal and vertical directions, can also measure the intensity of the beam, is very suitable for the beam parameter measurement of a low-energy high-intense proton beam.

Description

Technical field [0001] The invention belongs to the technical field of particle accelerators, and particularly relates to a device and method for measuring the intensity and beam emittance of a low-energy high-current proton beam. Background technique [0002] In the field of low-energy high-current proton accelerators, beam intensity (referred to as current intensity) and emittance are the two most important parameters of beam current. At a certain longitudinal position in the beam transmission process, the current intensity refers to the amount of charge passing through the beam cross-section per unit time, which characterizes the intensity of the beam; the emissivity refers to the abscissa of all particles in the beam The area occupied in the two-dimensional phase space whose position and ordinate are the divergence angle is a concentrated expression of the beam position and the degree of divergence, and is an important parameter that characterizes the beam quality. [0003] In...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01T1/29G01T7/00
CPCG01T1/29G01T7/00
Inventor 王忠明王敏文屈二渊王迪陈伟邱孟通
Owner NORTHWEST INST OF NUCLEAR TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com