Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Measurement platform device

A technology for measuring platforms and tanks, which is applied in the field of measuring platforms, can solve the problems of reducing measurement accuracy, poor sliding effect, affecting the stability and smoothness of offset seat 50, etc., so as to avoid component torque and increase structure The effect of mounting the contact surface, improving accuracy and durability

Inactive Publication Date: 2018-07-20
CHIUAN YAN TECH
View PDF7 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] It is not difficult to find that there are deficiencies in the above-mentioned conventional structure in detail, the main reasons are as follows: the first and second sliders 43, 53 between the base 40 and the offset seat 50 of the conventional measurement platform are parallel and juxtaposed configuration, and the first slider 43 only forms an L surface mounting contact with the base 40 by the bottom side and one side, and the second slider 53 forms an L surface with the offset seat 50 only by the top side and one side. When the offset seat 50 is under pressure, the first and second sliders 43 and 53 are likely to generate a moment of outward component force, resulting in poor sliding effect between the first and second sliders 43 and 53 , thereby affecting the stability and smoothness of the offset seat 50 sliding on the base 40, while reducing the measurement accuracy

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Measurement platform device
  • Measurement platform device
  • Measurement platform device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0079] In order to have a further understanding and understanding of the purpose, characteristics and effects of the present invention, please cooperate with the [simplified description of the drawings] to describe in detail as follows:

[0080] First, please see figure 1 , figure 2 Cooperate image 3 , Figure 4 Shown, a kind of measuring platform device, it comprises: a lower base 10, a slide seat 20, the upper surface of this lower base 10 has two parallel first cavities 11, and one between two first cavities 11 There are inter-connecting slots 12 parallel to each other, a first slider 13 is fixed in the two first containing slots 11, and a taper groove 131 is provided on the surface ends of the two first sliders 13, and the front, The rear end is provided with an X-axis stop block 14, and then a guide rail 15 is fixed in the joint groove 12, and a first limit slide 16 is also configured to slide and limit on the guide rail 15. The guide rail Both sides of the rod 15 ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a measurement platform device. The device comprises: a lower base and a sliding seat, wherein first and second sliding blocks between the lower base and the sliding seat are invertical contact with each other, when the structure are pressed, a structural mounting contact surface can be increased by the vertical stacking of the first and second sliding blocks, the componentforce moment is avoided, the sliding measurement effect is achieved, the sliding stability is ensured through rigidity of the first and second sliding blocks, and the accuracy and the durability of the structure are greatly improved.

Description

technical field [0001] The invention relates to the technical field of measurement platforms, in particular to a fine-tuning offset measurement platform device. Background technique [0002] The known fine-tuning platform device is widely used in various automatic precision machining positioning, processing and testing occasions, and can be matched with various optical components or testing instruments to perform high-precision measurement or inspection operations. Currently common fine-tuning platform devices, please also refer to Figure 13 , Figure 14 As shown, it mainly has a base 40 and an offset seat 50. Both sides of the base 40 have a strip-shaped recessed area 41, and the inner sides of the two strip-shaped recessed areas 41 have a stepped convex surface. 42, and provide a first slider 43 fixed on the convex surface 42, and form a convex rib 44 with accommodating area at the center of the base 40, the offset seat 50 is generally a rectangular plate, its A chute 5...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): F16M11/00
CPCF16M11/00
Inventor 邱毓英
Owner CHIUAN YAN TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com