A kind of flash corrosion potion suitable for msap process
A potion and flash etching technology, applied in chemical/electrolytic methods to remove conductive materials, printed circuits, electrical components, etc., can solve problems such as complex control, reduced reliability, and insufficient etching efficiency, and achieve simple processes and reliability High, manageable results
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Embodiment 1
[0020] This embodiment provides a kind of flash corrosion potion suitable for MSAP process, which is used in the etching process of fine lines, and the flash corrosion potion includes a solvent, a revetment agent for protecting the side wall of the circuit, and a wetting agent for accelerating etching. And the stabilizing agent used to maintain the stability of the liquid medicine system, the bank revetment agent, wetting agent and stabilizing agent
[0021] All are organic matter, wherein, the bank revetment agent has The material of (thiourea) structure, in the present embodiment, described revetment agent is thiourea, i.e. R 1 , R 2 Both are H, the concentration of the bank revetment agent in the flash corrosion solution is 1000ppm, the wetting agent is ethylene glycol, and its concentration is 5000ppm, and the stabilizer is glycine, and its concentration is 100ppm.
[0022] The flash corrosion potion also includes inorganic components, and the inorganic components inclu...
Embodiment 2
[0025] This embodiment provides a kind of flash corrosion potion suitable for MSAP process, which is used in the etching process of fine lines, and the flash corrosion potion includes a solvent, a revetment agent for protecting the side wall of the circuit, and a wetting agent for accelerating etching. And the stabilizing agent used to maintain the stability of the liquid medicine system, the bank revetment agent, wetting agent and stabilizing agent
[0026] All are organic matter, wherein, the bank revetment agent has The material of (thiourea) structure, in the present embodiment, described revetment agent is N-methylthiourea, i.e. R 1 is methyl, R 2 is H, the concentration of the bank revetment agent in the flash corrosion solution is 10ppm, the wetting agent is propylene glycol, and its concentration is 100ppm, and the stabilizer is serine, and its concentration is 1ppm.
[0027] The flash corrosion potion also includes inorganic components, and the inorganic components...
Embodiment 3
[0030] This embodiment provides a kind of flash corrosion potion suitable for MSAP process, which is used in the etching process of fine lines, and the flash corrosion potion includes a solvent, a revetment agent for protecting the side wall of the circuit, and a wetting agent for accelerating etching. And the stabilizing agent used to maintain the stability of the liquid medicine system, the bank revetment agent, wetting agent and stabilizing agent
[0031] All are organic matter, wherein, the bank revetment agent has The material of (thiourea) structure, in the present embodiment, described bank protection agent is 4-pyridyl thiourea, and the concentration of described bank protection agent in flash corrosion potion is 500ppm, and described wetting agent is glycerol, its The concentration is 1000ppm, and the stabilizer is threonine, and its concentration is 50ppm.
[0032] The flash corrosion potion also includes inorganic components, and the inorganic components include Cu...
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