Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Adsorption device and method of metal pattern plates, evaporation equipment and evaporation method

An adsorption device and mask technology, applied in vacuum evaporation plating, sputtering plating, gaseous chemical plating, etc., can solve the problems of FMM wrinkles, improve quality, enhance anti-deformation performance, and avoid unnecessary waste Effect

Active Publication Date: 2018-06-15
BOE TECH GRP CO LTD +1
View PDF4 Cites 14 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Embodiments of the present invention provide an adsorption device and adsorption method for a mask, evaporation equipment, and an evaporation method to solve the problem of wrinkles in the FMM after the mask is adsorbed during evaporation.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Adsorption device and method of metal pattern plates, evaporation equipment and evaporation method
  • Adsorption device and method of metal pattern plates, evaporation equipment and evaporation method
  • Adsorption device and method of metal pattern plates, evaporation equipment and evaporation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0062] This embodiment provides a mask adsorption device, such as Figure 5a ~ Figure 5d As shown, the adsorption component of the adsorption device includes: a first carrier board 11 , at least two electromagnets dispersedly arranged on the first carrier board, and at least two switches.

[0063] Wherein, the first carrier plate 11 is used to carry the electromagnet, and the first carrier plate 11 is a rigid flat plate.

[0064] The electromagnet can be embedded on the first carrier board 11 , or directly installed on the first carrier board 11 . The electromagnet can generate magnetic force when it is turned on, and at least two electromagnets included in the adsorption component can generate the same magnetic force at the same time, so that when the entire mask is adsorbed, a relatively uniform adsorption force can be generated on each area of ​​the mask . Such as Figure 3a As shown, the structure of the electromagnet 7 is: comprising an iron core 71, and several turns ...

example 1

[0075] Example 1: If Figure 6a ~ Figure 6c As shown, if the initial adsorption area is the central area of ​​the mask, the adsorption method includes: turn on the electromagnet corresponding to the initial adsorption area, and then turn on the corresponding electromagnet in turn from the initial adsorption area in a radial manner until The whole mask is adsorbed and adhered to the base substrate 5 , at this time, each electromagnet generates the same magnetic force, and exerts a uniform adsorption force on each area of ​​the whole mask. This adsorption method can be matched with Figure 4b The arrangement of the electromagnet shown in the adsorption part makes the magnetic force control of the adsorption part more precise.

example 2

[0076] Example 2: If Figure 7a ~ Figure 7c As shown, if the initial adsorption area is the central area of ​​each FMM of the mask, the adsorption method is similar to Example 1, and will not be repeated here.

[0077] It should be noted that the "central region" mentioned in this embodiment and the following embodiments 2 and 3 refers to the center point and the surrounding area, not limited to a circular area, but also a rectangular area, or other shapes area.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an adsorption device and method of metal pattern plates, evaporation equipment and an evaporation method so as to solve the problem that in evaporation, the metal pattern platesare adsorbed, and then an FMM wrinkles. The adsorption method comprises the steps that adsorption begins from a certain area or certain areas of each metal pattern plate, and then the adsorption range is gradually enlarged from the initial adsorption area till the whole metal pattern plates are attached to substrate base plates. The adsorption method is applied to the evaporation process of manufacturing of OLED display panels so as to improved the evaporation quality.

Description

technical field [0001] The present invention relates to the technical field of OLED (English full name: Organic Light-Emitting Diode, Chinese name: Organic Light-Emitting Diode) display panel manufacturing technology, in particular to an adsorption device and adsorption method for a mask plate, evaporation equipment and evaporation method . Background technique [0002] At present, the production of OLED display panels mainly adopts the method of evaporation coating. During the evaporation process, FMM (English full name: Fine Metal Mask, Chinese name: high-precision metal mask plate) is required to deposit R (red) Sub-pixels, G (green) sub-pixels, B (blue) sub-pixels and other film layers to ensure that the thin film material is evaporated at the specified position. [0003] Such as Figure 1a ~ Figure 1d As shown, a masking strip 2 (Cover), a supporting strip 3 (Howling) and a strip-shaped FMM 4 are sequentially welded on a metal frame 1 (Frame) to form a set of mask plat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24C23C14/54H10K71/166C23C16/52H10K71/00
Inventor 罗昶吴建鹏
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com