Novel magnetic fluid-piezoelectric film structure device and production method thereof
A technology of piezoelectric film and manufacturing method, applied in the field of new magnetic fluid-piezoelectric film structure device and its manufacturing, to achieve the effects of avoiding difficult maintenance, good working stability and strong anti-interference ability
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[0053] 1. Select silicon wafer as the substrate layer, and clean and dry the silicon wafer for later use;
[0054] 2. Using low-pressure chemical vapor deposition to grow a layer of low-stress SiO with a thickness of 2 µm on the surface of the silicon wafer 2 Film, as the support layer of the piezoelectric film layer;
[0055] 3. The bulk silicon etching process is used to remove most of the silicon on the back of the silicon substrate layer to release the piezoelectric sandwich structure;
[0056] 4. Deposit metal Al with a thickness of 2nm as the lower electrode layer and pattern it;
[0057] 5. Using the magnetron sputtering method, deposit a 3μm ZnO piezoelectric film layer with a preferred orientation parallel to the c axis, and pattern the leads of the lower electrode layer to be exposed;
[0058] 6. Deposit metal Al with a thickness of 2nm as the upper electrode layer and pattern it, and lead the upper electrode layer to the plane of the lower electrode layer to connect to the ex...
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