Pixel defining layer and preparation method and application thereof

Abstract

The invention provides a pixel defining layer and a preparation method and application thereof. The pixel defining layer comprises the following steps that S1, a substrate is obtained, wherein the substrate is provided with a patterned pixel electrode; S2, a layer of negative photoresist thin film is deposited on the substrate; S3, an illumination mask is obtained, and a gap is formed between theillumination mask and the negative photoresist thin film, wherein the gap is 50-200 micrometers; S4, exposure is carried out on the negative photoresist thin film by utilizing the illumination mask, wherein the exposure dose is 100-300 mj / cm<2>; S5, developing operation is carried out on the exposed negative photoresist thin film, the non-exposed negative photoresist thin film is removed, and a pixel defining layer is formed. According to the preparation method of the pixel defining layer, the exposure distance between the illumination mask and the negative photoresist thin film is increased during exposure so that a small tape angle can be formed. The method is simple, easy to operate and low in cost, thin film breaking cannot be caused when a top electrode is evaporated, and the productyield is increased.

Description

technical field [0001] The invention relates to the technical field of light-emitting devices, in particular to a pixel defining layer and its preparation method and application. Background technique [0002] In the contemporary information society, the importance of the display as a visual information transmission medium is further strengthened. In order to occupy a dominant position in the future, the display is moving towards lighter, thinner, lower power consumption, lower cost and better image quality. trend development. [0003] Organic light-emitting diodes (OLEDs) have the advantages of self-luminescence, fast response, wide viewing angle, high brightness, and thinness; These advantages have become the two main directions for the development of the display field at present. [0004] At present, whether OLED or QLED is used as a light-emitting pixel unit of a display panel, it is necessary to make a pixel-defining layer (bank) in the pixel unit to define the light-e...

AI Technical Summary

Problems solved by technology

Pixel banks are generally made of photoresist materials. Negative photoresist materials are cheaper than positive photoresist materials. From the perspective of cost reduction, negative photoresists are generally used to make pixel banks. However, negative photoresist materials are used to make pixel banks. When photoresist is used to make pixel banks, it is easy to form chamfers, such as figure 1 As shown, because when the negative photoresist is exposed, the exposure dose received by the upper film is relatively larger than that of the lower film, so it is easy to form chamfers after exposure and development.

The existence of chamfering, in the later film deposition process, especially when evaporating the top electrode, is likely to cause film breakage, form defects, and reduce product yield

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