Semiconductor structure and forming method thereof
A technology of semiconductor and interconnection structure, which is applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, semiconductor/solid-state device components, etc. The effect of increasing the value, reducing the difficulty, and simplifying the process
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[0027] As mentioned in the background, in the prior art, when a capacitor is formed in a low-K dielectric layer, the overall area of the capacitor is relatively large, which reduces the degree of integration of the circuit.
[0028] In order to solve the above problems, the present invention provides a semiconductor structure and a method for forming the same. In the method of the present invention, the area occupied by the capacitor formed in the low-K dielectric layer is small, and the integration of the capacitor and the interconnection structure (plug) is realized. make.
[0029] In order to make the above objects, features and advantages of the present invention more comprehensible, specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. When describing the embodiments of the present invention in detail, for convenience of explanation, the schematic diagrams will not be partially enlarged according t...
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