Anti-acne skin-caring mask
A facial mask and acne-removing technology, applied in skin care preparations, skin diseases, cosmetics, etc., can solve the problems of destroying the skin's micro-ecological balance, irritating and side effects, and damaging the drug resistance of the stratum corneum, so as to promote microcirculation. Rebuild, reduce inflammatory effects, promote microcirculation effect
Inactive Publication Date: 2017-09-15
FOSHAN HUIMU CHEM TECH CO LTD
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Problems solved by technology
[0003] Chinese patent application CN 104434620A discloses an anti-acne composition and a preparation method thereof, including carbomer resin, hydroxyethyl cellulose, betaine, menthol, salicylic acid, propylene glycol, chitosan and other components. The salicylic acid contained in the invented ingredients can dissolve the constituent substances between the cuticles and make the cuticles fall off. Long-term use will burden the skin. Sensitive skin and oily skin are not suitable for using products containing salicylic acid
[0004] At present, many acne products on the market add hormones, antibiotics, fruit acids and other ingredients, which have great irritation and side effects, will damage the stratum corneum or produce drug resistance, destroy the micro-ecological balance of the skin, and lead to other more serious skin problems, such as Pus
Or many products that claim to have the effect of removing acne have a single effect, and the effect of removing acne is not obvious
Therefore, the existing technology lacks safe, acne-removing effect, and cost-effective acne-removing products
Method used
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[0020] The preparation method of antiacne skin care mask described in embodiment 1~5, comprises the following steps:
[0021] Mix humectant, thickener, anti-sensitizer, disodium EDTA, PEG-60 hydrogenated castor oil, and deionized water into the stirring pot, stir and heat to 85°C, stir and dissolve completely; cool down to 50°C, add three Ethanolamine, plant composition, and preservative are stirred evenly, cooled and discharged.
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Abstract
The invention provides an acne-removing skin care facial mask, which comprises sagebrush extract, aralia root bark extract, sorrel extract, moisturizing agent, antisensitivity agent and other components. The mask can inhibit the secretion of inflammatory factors, remove microbial secretions, reduce pore clogging, promote the reconstruction of microcirculation, and finally achieve a significant effect of acne removal; promote skin reconstruction and regeneration at acne scars, and then effectively promote the elimination of acne scars; The generation of active oxygen free radicals improves the vitality of cells and the antioxidant capacity of the cells themselves, thereby strengthening the anti-aging ability of the skin, making the skin fairer and more elastic; the ingredients of the mask are safe, mild and non-irritating, non-toxic and side effects, and easy to prepare ,Market prospects.
Description
technical field [0001] The invention relates to the field of cosmetics, in particular to a facial mask for removing acne and skin care. Background technique [0002] The cause of acne is generally during puberty, hormones in the body will stimulate hair growth, and the secretion of sebaceous glands will be strong, resulting in clogged pores and forming a acne core. It takes 6 to 9 months for a micropowder thorn to grow out of the skin surface from the growth stage. Micropowder thorns clog pores and induce inflammation, which is the origin of pimples, pustules, nodules and cysts. Traditional treatment only removes the acne on the surface, but the micropowder pimples grow back after a period of time! As a result, the situation of recurrent acne has been formed, and the reason for the long-term sebum secretion of sebaceous glands is exuberant and long-term acne. Research on skin cell physiology points out that sensitive skin is caused by damaged skin cells, which reduces the...
Claims
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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61Q19/08A61Q19/00A61K36/28A61P17/10
CPCA61K8/97A61K36/185A61K36/25A61K36/28A61K2800/72A61K2800/82A61Q19/00A61Q19/08
Inventor 不公告发明人
Owner FOSHAN HUIMU CHEM TECH CO LTD
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