Parallel double-gas chamber trace gas analysis system, and gas concentration calculating method
A technology of trace gas and analysis system, which is applied in the direction of analyzing materials, analyzing materials through optical means, measuring devices, etc., can solve the problems of increasing equipment cost, increasing equipment volume, and not being able to fully guarantee the accuracy of measurement concentration, and achieve accurate inversion effect
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[0040] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0041] Such as figure 1A parallel double gas chamber trace gas analysis system is shown, including a circuit module 1, an optical module 2 and a gas path module 3,
[0042] The circuit module 1 is divided into a control circuit 1.1, a signal processing circuit 1.2 and a data processing unit 1.3, and the control circuit 1.1 includes a modulation waveform generator 1.1.1, a laser drive circuit 1.1.2 and a digital temperature control module 1.1.3, The modulation...
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