Preparation method for frequency-reconfigurable sleeve dipole antenna of Ge heterojunction SPiN diode
A dipole antenna and diode technology, which is applied in the field of Ge heterogeneous SPiN diode frequency reconfigurable sleeve dipole antenna preparation, can solve problems such as difficult to meet various system requirements and application environments, and achieve small size and easy processing , The effect of rapid frequency jump
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Embodiment 1
[0055]See figure 1 , figure 1 A structural schematic diagram of a Ge heterogeneous SPiN diode frequency reconfigurable sleeve dipole antenna provided by an embodiment of the present invention. The antenna includes GeOI substrate 1, SPiN diode antenna arm 2, first SPiN diode sleeve 3, second SPiN diode sleeve 4, coaxial feeder 5, DC bias lines 9, 10, 11, 12, 13, 14 , 15, 16, 17, 18, 19; among them,
[0056] The SPiN diode antenna arm 2, the first SPiN diode sleeve 3, the second SPiN diode sleeve 4, and the DC bias lines 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, and 19 are all fabricated on the GeOI substrate 1; the SPiN diode antenna arm 2, the first SPiN diode sleeve 3 and the second SPiN diode sleeve 4 pass through the coaxial feeder 5 connection, the inner core wire 7 of the coaxial feeder 5 is connected to the SPiN diode antenna arm 2 and the outer conductor 8 of the coaxial feeder 5 is connected to the first SPiN diode sleeve 3 and the second SPiN diode sleeve cartridge 4...
Embodiment 2
[0077] See image 3 , image 3 A schematic diagram of a method for fabricating a lateral SPiN diode provided by an embodiment of the present invention. The preparation method may comprise the steps of:
[0078] (a) setting an isolation region on the GeOI substrate according to the structure of the sleeve dipole antenna;
[0079] (b) etching the GeOI substrate to form a P-type trench and an N-type trench, and the depth of the P-type trench and the N-type trench is less than the thickness of the top layer Ge of the GeOI substrate;
[0080] (c) filling the P-type trench and the N-type trench, and forming a P-type active region and an N-type active region in the P-type trench and the N-type trench by using an ion implantation process ;as well as
[0081] (d) forming leads on the GeOI substrate to form the lateral SPiN diode.
[0082] Wherein, step (a) may include:
[0083] (a1) forming a first protective layer on the surface of the GeOI substrate;
[0084] (a2) forming a fi...
Embodiment 3
[0106] See Figure 6a-Figure 6r , Figure 6a-Figure 6r It is a schematic diagram of a method for fabricating a lateral SPiN diode according to an embodiment of the present invention. In this embodiment, on the basis of the above-mentioned embodiments, the preparation of the SPiN diode is described in detail by taking the preparation of a GaAs-based SPiN diode (solid-state plasma PiN diode) with a plasma region length of 100 μm as an example, and the specific steps are as follows:
[0107] On the basis of the above-mentioned embodiment 1, the preparation of a heterogeneous Ge-based solid-state plasma pin diode with a channel length of 22 nm (the length of the solid-state plasma region is 100 microns) is taken as an example to describe in detail, and the specific steps are as follows:
[0108] Step 1, substrate material preparation steps:
[0109] (1a) if Figure 6a As shown, the (100) crystal orientation is selected, the doping type is p-type, the doping concentration is a G...
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