Microwave plasma chemical vapor deposition diamond reaction device
A technology of chemical vapor deposition and microwave plasma, which is applied in gaseous chemical plating, metal material coating process, coating, etc., can solve diamond pollution and other problems, and achieve the effects of avoiding pollution, avoiding damage, and reducing production costs
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[0023] In order to enable those skilled in the art to better understand the present invention, the present invention will be further clearly and completely described below in conjunction with reference to the accompanying drawings and in conjunction with embodiments. It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other.
[0024] Such as figure 1As shown, a microwave plasma chemical vapor deposition diamond reaction device includes a resonant cavity, and the resonant cavity is divided into an upper cylindrical cavity 1, a middle arc-shaped cavity 2 and a lower cylindrical cavity 3. Among them, the middle arc-shaped cavity 2 is a spherical cavity with the upper and lower parts cut off, the radius of curvature R of the middle arc-shaped cavity 2 is equal to the microwave wavelength λ, and the diameter of the upper cylindrical cavity 1 is larger than the middle circle Th...
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