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Absolute measurement method of homogeneity of optical flat

A parallel plate and absolute measurement technology, applied in the field of optical interferometry, can solve problems such as inconvenient operation, complicated operation, and inability to obtain quantitative results, and achieve the effect of less steps and simple operation

Active Publication Date: 2017-03-15
NANJING UNIV OF SCI & TECH
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Problems solved by technology

[0004] In summary, measuring the uniformity of optical materials with a pair of collimated light tubes is a qualitative measurement, and quantitative results cannot be obtained; using general interferometric methods to measure, the final results include the front and rear surface wavefront errors of the sample and the interferometer The wavefront error of the standard mirror, or the wavefront error including the working surface of the reference flat crystal; using the immersion method to measure the uniformity of optical materials, it is necessary to prepare a refractive index liquid consistent with the refractive index of the object to be tested, which is inconvenient to operate; using holographic differential interference method, interferometer transmission measurement method and wavelength tuning interferometry method are all absolute measurement methods, but there are many measurement steps and the operation is more complicated

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  • Absolute measurement method of homogeneity of optical flat

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Embodiment 1

[0076] The absolute measurement method for the uniformity of optical parallel flat glass of the present invention is based on the spatial spectroscopic coaxial Fizeau type synchronous phase-shifting interferometer system, adding a λ / 4 wave plate between the collimating lens and the checkerboard grating, and adjusting the λ / 4 The angle of the wave plate makes the laser light emitted by the light source system circularly polarized, which specifically includes the following steps:

[0077] Step 1, put the optical parallel plate to be measured into the measurement optical path, and measure the wavefront deviation of the interferometric cavity formed by the front and rear surfaces of the optical parallel plate, as follows:

[0078] (1.1) Adjust the three-dimensional posture of the optical parallel plate to be measured so that the light returned from the front surface is self-collimated and returns to the light source system. In addition, the reference flat crystal and the reflectiv...

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Abstract

The invention discloses an absolute measurement method of homogeneity of an optical flat, belonging to the field of optical interferometry. The method comprises the following steps: 1. putting detected optical flat into a measurement light path, and measuring the wave surface deviation of interference cavities formed by the front and back surfaces of the optical flat; 2. putting the optical flat into an interferometry cavity formed by reference optical flat working surfaces and reflection optical flat working surfaces, and measuring the aberration of waves reflected by the optical flat; 3. removing the detected optical flat from the interferometry cavity, and measuring the wave surface deviation of the interferometry cavity formed by the reference optical flat working surfaces and reflection optical flat working surfaces; and calculating the homogeneity distribution of the detected optical flat according to the three measurement results. The method has the advantages of fewer steps and high accuracy, is simple to operate, and can be used for high-precision measurement of refractivity homogeneity distribution of the optical flat for laser working materials and spacecraft window glass.

Description

technical field [0001] The invention belongs to the technical field of optical interference measurement, in particular to an absolute measurement method for the uniformity of optically parallel flat glass. Background technique [0002] Optical uniformity is an important indicator of optical materials. With the continuous development of optical processing and manufacturing technology, its accurate measurement has become an important topic. At present, there are two types of measurement methods for the uniformity of optical materials: qualitative measurement and quantitative measurement. Quantitative measurement can be divided into general measurement and absolute measurement. General measurement refers to the measurement that the test results include the wavefront error of the sample polishing, the wavefront error of the mounted plate, and the wavefront error of the standard mirror of the test instrument. Absolute measurement refers to the measurement that removes the sample...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/45
CPCG01N21/45
Inventor 陈磊张瑞朱文华韩志刚郑东晖孟诗孙沁园乌兰雅图
Owner NANJING UNIV OF SCI & TECH
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