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Magnetorheological polishing grinding wheel device adopting open magnetic field

A magnetorheological polishing and open technology, applied in the direction of optical surface grinders, grinding/polishing equipment, grinding machines, etc., can solve the problems of difficulty in improving electromagnetic strength, complex equipment structure, and low processing efficiency, and avoid the vortex effect , Improve processing efficiency, simple structure

Active Publication Date: 2017-02-22
SHENZHEN ZHIBO GAOKE ELECTRO OPTICS EQUIP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0010] In view of the deficiencies in the existing technology, the purpose of the patent of the present invention is to provide a magneto-rheological polishing grinding wheel device using an open magnetic field, which can overcome the problems of the existing technology that the electromagnetic intensity is difficult to increase, the processing efficiency is low, and the equipment structure is complicated.

Method used

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  • Magnetorheological polishing grinding wheel device adopting open magnetic field
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  • Magnetorheological polishing grinding wheel device adopting open magnetic field

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Embodiment Construction

[0030] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0031] Such as Figure 1-3 As shown, the magnetorheological polishing grinding wheel device with an open magnetic field includes a main magnetic pole and a rotating magnetic pole 2. The main magnetic pole is installed on the base 15 through a third screw 17. The main magnetic pole includes an outer wall 11, an inner wall 12, and an annular bottom surface 13. , the main magnetic pole is integrally formed, there is a gap between the outer wall 11 and the inner wall 1...

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Abstract

The invention discloses a magnetorheological polishing grinding wheel device adopting an open magnetic field. The magnetorheological polishing grinding wheel device comprises a main magnetic pole and a rotating magnetic pole, wherein the main magnetic pole comprises an outer wall, an inner wall and a circular ring-shaped bottom surface; the main magnetic pole is integrally formed; a clearance is reserved between the outer wall and the inner wall; a copper coil is mounted inside the clearance; the rotating magnetic pole is embedded in the inner wall; a working groove filled with a magnetorheological fluid is further embedded in the upper end of the rotating magnetic pole; a grinding wheel which enables the magnetorheological fluid to form a Bingham body is arranged at the upper end of the rotating magnetic pole; and a belt pulley mounting shaft is connected at the lower end of the rotating magnetic pole. The magnetorheological polishing grinding wheel device has the advantages that the structure is simple, the device is convenient and practical, a vortex effect can be avoided, the processing efficiency is improved, the problem of unstable motion is overcome, a closed loop does not need to be formed, a stable strong magnetic field can be generated, and the polishing purpose is achieved.

Description

technical field [0001] The invention relates to the technical field of ultra-smooth processing on the surface of optical parts, in particular to an electromagnetic polishing grinding head and a device with an open magnetic field. Background technique [0002] The development of modern short-wave science, strong light optics, electronics and thin film science requires that optical components should have high reflectivity, high surface accuracy, low roughness and high strength, so the requirements for optical surfaces are extremely stringent, such as surface without lattice Distortion defects, basically no residual stress, extremely low surface roughness, no contamination by foreign impurities, high geometric accuracy, and the substrate surface should have accurate crystal orientation, etc. In particular, the huge increase in the demand for optical parts with irregular shapes such as 2.5D, 3D, and spherical surfaces has put forward more and more stringent requirements for the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B1/00B24B13/00
CPCB24B1/005B24B13/00
Inventor 白素华杨志忠
Owner SHENZHEN ZHIBO GAOKE ELECTRO OPTICS EQUIP
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