Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation of a novel organic / inorganic composite sizing system

A new type of surface sizing technology, applied in the direction of inorganic compound addition, no pigment coating, water repellent addition, etc., can solve the problems of environmental pollution and hazards of operators, affect the strength of paper, and high cost, and achieve the goal of reducing environmental pollution Risk, low cost, and the effect of a clean papermaking system

Active Publication Date: 2017-01-04
GUANGDONG PAPER IND RES INST
View PDF3 Cites 9 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, SMA and SAA are prone to foaming when sizing on the surface, which affects the strength of the paper, and they are all made of organic solvents such as benzene and toluene, which will bring a certain degree of pollution and harm to the operators and the environment during manufacturing and application. Hazard; the medium used for PUD sizing agent and SAE sizing agent is water, which meets the requirements of today's green products and has good printing performance, but it puts forward higher requirements for internal sizing
my country's polymer surface sizing agent mainly depends on imports, and the cost is very high

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation of a novel organic / inorganic composite sizing system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] Degradation of chitosan: dissolving chitosan in an Erlenmeyer flask with 4% acetic acid by mass fraction, completely dissolving chitosan at a temperature of 60°C, adding 4% H2O2 dropwise at a constant speed while stirring, The rotation speed was 150 r / min, and the reaction was kept for 4 h, then 2 mol / L NaOH solution was added to the reaction solution, neutralized to neutral (pH = 7), left overnight, filtered with suction, and the volume ratio was added to the filtrate 3:1 95% ethanol-water solution, let stand for 1 h to settle, centrifuge out the degradation products, wash with ethanol and vacuum dry.

[0022] Preparation of silica sol: Add a certain amount of deionized water into the three-necked flask, raise the temperature to 70 °C, add 1 / 3 of the weighed silicon powder mass and 1 / 3 of the weighed sodium hydroxide mass to the three-necked flask , keep the reaction for 1 h. Then the temperature was raised to 75 °C, and then 1 / 3 of silicon powder and 1 / 3 of sodium hy...

Embodiment 2

[0026] Degradation of chitosan: dissolving chitosan in a conical flask with 4% acetic acid by mass fraction, dissolving chitosan completely at 60°C, adding 2% H2O2 dropwise at a constant speed while stirring, The rotation speed was 150 r / min, and the reaction was kept for 4 h, then 2 mol / L NaOH solution was added to the reaction solution, neutralized to neutral (pH = 7), left overnight, filtered with suction, and the volume ratio was added to the filtrate 3:1 95% ethanol-water solution, let stand for 1 h to settle, centrifuge out the degradation products, wash with ethanol and vacuum dry.

[0027] Prepare silica sol: add 30 nm silica sol in 200 mL deionized water as a seed solution, control the concentration at 1.0%, add 15 g silica powder and 0.3 g sodium hydroxide in batches, react at 90 °C for 8 h, The prepared silica sol has a particle size of 50 nm.

[0028] Preparation of compound sizing system: Degraded chitosan is made into an aqueous solution with a mass fraction of ...

Embodiment 3

[0031]Degradation of chitosan: dissolving chitosan in an Erlenmeyer flask with 4% acetic acid by mass fraction, fully dissolving chitosan at a temperature of 50°C, adding H2O2 with a mass fraction of 43% at a constant speed while stirring, The rotation speed was 150 r / min, and the reaction was kept for 4 h, then 2 mol / L NaOH solution was added to the reaction solution, neutralized to neutral (pH = 7), left overnight, filtered with suction, and the volume ratio was added to the filtrate 3:1 95% ethanol-water solution, let stand for 1 h to settle, centrifuge out the degradation products, wash with ethanol and vacuum dry.

[0032] Prepare silica sol: add 30 nm silica sol in 200 mL deionized water as a seed solution, control the concentration at 1.5%, add 15 g silica powder and 0.3 g sodium hydroxide in batches, and react at a temperature of 90 °C for 8 h. Prepare silica sol.

[0033] Preparation of compound sizing system: degraded chitosan was made into a 30% aqueous solution wi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Particle sizeaaaaaaaaaa
Viscosityaaaaaaaaaa
Viscosityaaaaaaaaaa
Login to View More

Abstract

The invention discloses a novel surface sizing system--chitosan / silica sol double sizing system: it combines the degraded chitosan with silica sol to form a stable complex system of organic matter and inorganic matter. The mass ratio of sugar to silica sol is 2: 3 - 1: 9. Water-soluble chitosan is prepared by hydrogen peroxide oxidation degradation method. Silica sol is synthesized by the dissolving method of monatomic silicon. The new paper making agent formed by the compounding is applied to the surface sizing of cultural paper. it can obviously promote the water resistance on the paper surface, surface strength, the degree of internal bonding, galling speed and other properties, improving printing performance and meanwhile reducing the cost of sizing.

Description

technical field [0001] The invention belongs to the field of papermaking chemicals, and relates to the preparation of a novel organic / inorganic composite sizing system and its use for surface sizing. Background technique [0002] The surface sizing agents used in the paper industry mainly include traditional surface sizing agents and synthetic polymer surface sizing agents. The most widely used products of traditional surface sizing agents are starch and its modified products, polyvinyl alcohol (PVA), carboxymethyl cellulose (CMC), and polyacrylamide (PAM). The commercially available synthetic polymer surface sizing agents at home and abroad mainly include styrene-maleic anhydride solution polymer (SMA), styrene-acrylic acid solution polymer (SAA), water-based polyurethane latex (PUD) and styrene-acrylic acid Emulsion polymers (SAE). [0003] The sizing mechanism of the traditional surface sizing agent is to use its hydrophilic groups (such as hydroxyl groups, amino groups...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): D21H21/16D21H23/50D21H19/14D21H19/32D21H17/68D21H17/67D21H21/18
CPCD21H17/67D21H17/675D21H17/68D21H19/14D21H19/32D21H21/16D21H21/18D21H23/50
Inventor 张薇陈继伟
Owner GUANGDONG PAPER IND RES INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com