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Composition for glass, low-surface-tension alkali-free glass as well as preparation method and application thereof

A low surface tension, alkali-free glass technology, used in optics, instruments, electrical components, etc., can solve the problems of low thermal stability and low formation stability of alkali-free glass plates, and achieve high specific modulus, high strain point, Effects of high liquidus temperature

Active Publication Date: 2016-08-17
WUHU DONGXU OPTOELECTRONICS EQUIP TECH +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] The object of the present invention is to provide a glass composition, low surface tension alkali-free glass and its preparation method and application

Method used

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  • Composition for glass, low-surface-tension alkali-free glass as well as preparation method and application thereof
  • Composition for glass, low-surface-tension alkali-free glass as well as preparation method and application thereof
  • Composition for glass, low-surface-tension alkali-free glass as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-17

[0076] Weigh each component as shown in Tables 1 and 2, mix well, pour the mixture into a platinum crucible, then heat in a 1530°C resistance furnace for 4 hours, and stir with a platinum rod to remove air bubbles. The molten glass is poured into a stainless steel cast iron mold to form a specified block glass product, and then the glass product is annealed at 830°C for 2 hours in the annealing furnace, and then the power is turned off and the furnace is cooled to 25°C. The glass product is cut, ground and polished, then cleaned with deionized water and dried to obtain a finished glass product. Various properties of each glass product were measured respectively, and the results are shown in Tables 1 and 2.

Embodiment 18-20 and comparative example 1-4

[0078] According to the method of Example 3, the difference is that the performance measurement results of the mixture components and the obtained product are shown in Table 3.

[0079] Comparing the data in Tables 1-2 and Table 3 shows that the glass prepared by the present invention has lower surface tension and higher comprehensive stability. The composition for glass or the alkali-free glass with low surface tension of the present invention can be used to prepare display devices and / or solar cells, especially can be used to prepare base glass substrate materials for flat panel display products.

[0080] Comparing Example 1 and Example 18, B 2 o 3 +0.5*MgO+0.3*Y 2 o 3 <8mol%, so that the thermal stability and glass formation stability of the prepared glass can be significantly improved.

[0081] Comparing Example 1 and Example 19, it can be seen that when the composition for glass contains B 2 o 3 , based on the total moles of each component of the composition for gla...

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Abstract

The invention relates to the field of glass manufacturing, and discloses a composition for glass. The composition for glass comprises the following components on the basis of the total mole amount of the components of the composition for glass: 68-73.5mol% of SiO2, 11-16mol% of Al2O3, 0.1-4mol% of ZnO, 0.001-0.5mol% of WO3, 0.3-1.5mol% of CaF2 and / or SrCl2, 3-20mol% of alkaline earth metal oxides and 0.1-3mol% of rare earth oxides. The invention further discloses low-surface-tension alkali-free glass as well as a preparation method and application thereof. The low-surface-tension alkali-free glass disclosed by the invention is relatively excellent in comprehensive stability and relatively low in surface tension.

Description

technical field [0001] The invention relates to the field of glass manufacturing, in particular to a composition for glass, low surface tension alkali-free glass and a preparation method and application thereof. Background technique [0002] With the rapid development of the optoelectronic industry, the demand for various display devices is increasing, such as active matrix liquid crystal display (AMLCD), organic light emitting diode (OLED) and active matrix liquid crystal display (LTPS TFT- LCD) devices, these display devices are based on the use of thin-film semiconductor materials to produce thin-film transistor (TFT) technology. The mainstream silicon-based TFT can be divided into amorphous silicon (a-Si) TFT, polycrystalline silicon (p-Si) TFT and single crystal silicon (SCS) TFT, among which amorphous silicon (a-Si) TFT is the current mainstream TFT-LCD With the applied technology, its production and preparation can be completed at a temperature of 300-450°C. For dis...

Claims

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Application Information

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IPC IPC(8): C03C3/095G02F1/1333H01L27/12
CPCC03C3/095G02F1/1333G02F1/133302H01L27/1218
Inventor 张广涛何豪闫冬成王丽红胡恒广王俊峰李志勇
Owner WUHU DONGXU OPTOELECTRONICS EQUIP TECH
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