Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Release film and manufacturing method of release film

A technology of peeling film and peeling agent layer, applied in the direction of film/sheet-like adhesives, adhesives, etc., can solve the problems of increased peeling force, difficulty in controlling peeling force, blocking resistance, type limitation, etc. Excellent adhesion effect

Inactive Publication Date: 2016-08-10
LINTEC CORP
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in the release film described in Patent Document 1, since the release layer contains inert fine particles, the surface roughness is improved and the blocking resistance is excellent. The release force increases under the influence of active fine particles, and it is difficult to achieve both the control of the release force and the blocking resistance according to the purpose
Therefore, in the release film described in Patent Document 1, the type of release layer-forming composition used for the formation of the release layer is limited, and there are cases where sufficient performance cannot be obtained as a release film.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Release film and manufacturing method of release film
  • Release film and manufacturing method of release film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0074] As a substrate, a polyethylene terephthalate (PET) film (thickness: 38 μm, arithmetic average roughness Ra: 20 nm, maximum protrusion height Rp: 200 nm) having the same surface and back surface roughness was used. Next, on one side of the base material, the composition A for forming a release agent layer was applied by stripe coating so that the thickness after drying was 0.1 μm, and the release agent layer was formed by drying at 120° C. for 1 minute. Thus, a release film was obtained.

Embodiment 2

[0076] A release film was produced in the same manner as in Example 1, except that the substrate had a thickness of 38 μm, an arithmetic mean roughness Ra: 9 nm, and a maximum protrusion height Rp: 95 nm.

Embodiment 3

[0078] In addition to using the release agent layer-forming composition B instead of the release agent layer-forming composition A, and applying the release agent layer-forming composition B by streak coating so that the thickness after drying is 0.15 μm, A release film was produced in the same manner as in Example 1.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
surface roughnessaaaaaaaaaa
Login to View More

Abstract

The invention provides a release film with excellent smoothness and anti-adhesion performance, and a manufacturing method of the release film. The release film (1) includes a base material (11) formed by a polyester film, and a release agent layer (12) which is coated on a surface (11a) of the base material (11) to form a composition; the arithmetic mean roughness (Ra) is greater than 5 nm and less than 40 nm, and the maximum rise height (Rp) is greater than 50 nm and less than 1000 nm; the thickness of the release agent layer (12) is greater than 0.05 [mu]m and less than 0.35 [mu]m; adhesion energy of the release agent layer (12) is greater than 15 mJ / m2 and less than 35 mJ / m2, wherein the adhesion energy is calculated by using a force curve measured by an interatomic force microscope.

Description

technical field [0001] This invention relates to the manufacturing method of a peeling film and a peeling film, Specifically, It is related with the manufacturing method of a peeling film and a peeling film which use a polyester film as a base material. Background technique [0002] A release film with a release agent layer is laminated on the adhesive layer to protect the adhesive surface of the adhesive material, or is used as a carrier for forming a resin film and a ceramic green sheet into a film (For example, refer to Patent Document 1). In the release film described in this Patent Document 1, the release layer provided on one surface of the polyester film contains inert fine particles such as silica particles. In this release film, since the surface roughness of the release layer is appropriately roughened by the inert fine particles contained in the release layer, it is possible to prevent the front and back of the release film from closely adhering when the release ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C09J7/02
CPCC09J7/22C09J7/255
Inventor 黑川敦史高桥亮宫本皓史
Owner LINTEC CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com