Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sapphire optical performance improvement method based on micron-scale array structure and yttrium oxide thin film

An array structure and optical performance technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problems of few film selection, difficult matching, complex surface microstructure treatment design, etc. cost effect

Active Publication Date: 2018-08-17
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Surface coating has problems such as few choices of film systems and difficulty in matching between different films, while the design of surface microstructure treatment is complicated

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sapphire optical performance improvement method based on micron-scale array structure and yttrium oxide thin film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] The diameter of the bottom surface of the cone is 2.6 μm, the period is 0.4 μm, and the heights are 1.2 μm, 1.4 μm and 1.6 μm respectively. The preparation parameters of yttrium oxide: power 150W, sputtering pressure 2Pa, oxygen flow 3sccm, argon flow 30sccm, thickness 200nm, 350℃ Insulation annealing in air for 2h. The average optical properties of the measured sapphire in the 3-5 μm mid-infrared band are shown in Table 1.

[0020] Table 1 Effects of different microstructure heights on the optical properties of sapphire

[0021] Cone height / μm

Embodiment 2

[0023] Conical bottom diameter 2.6μm, period 0.4μm, height 1.6μm, yttrium oxide preparation parameters: power 150W, sputtering pressure 2Pa, oxygen flow rate 3sccm, argon flow rate 30sccm, heat preservation and annealing in air at 350°C for 2h, thickness of 100, 200 and Table 2 shows the average optical properties of sapphire measured at 300nm in the 3-5μm mid-infrared band.

[0024] Table 2 Effects of different film thicknesses on the optical properties of sapphire

[0025] Film thickness / nm

Embodiment 3

[0027] Conical bottom diameter 2.6μm, period 0.4μm, height 1.6μm, yttrium oxide preparation parameters: power 150W, sputtering pressure 1.0Pa, 3.0Pa and 5.0Pa, oxygen flow 3sccm, argon flow 30sccm, heat preservation and annealing in air at 350°C for 2h , with a thickness of 200nm, the average optical properties of the measured sapphire in the mid-infrared band of 3-5μm are shown in Table 3.

[0028] Table 3 Effects of different sputtering pressures on the optical properties of sapphire

[0029] Sputtering pressure / Pa

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
thicknessaaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a sapphire optimal performance improving method based on a micron-order array structure and an yttrium oxide film. A sapphire substrate is subjected to micro-structural treatment, and a periodical cone structure is formed on the surface of the sapphire substrate; a sapphire with the microstructure serves as the substrate, and the yttrium oxide film is prepared on the surface of the sapphire through reaction magnetron sputtering; and after sputtering is completed, heat insulation annealing is conducted in the air at the temperature ranging from 340 DEG C to 400 DEG C for 1 h to 2 h. By means of the sapphire optimal performance improving method, surface film plating and surface micro-structural treatment are organically combined, in other words, the single-layer yttrium oxide film is matched with the microstructure of the specific size, and the optical performance of the sapphire is improved. The yttrium oxide film with the refractive index higher than that of the sapphire is selected as an antireflection film, proper preparing and annealing processes are adopted, the yttrium oxide film which is of a columnar structure, has a cubic phase and is free of absorbed oxygen is obtained, the thickness of the film is adjusted, and the beneficial effect of extending the microstructure with low cost and high efficiency is achieved.

Description

technical field [0001] The invention relates to a method for improving the optical performance of sapphire based on a micron-scale array structure and an yttrium oxide thin film, in particular to a method and parameters for surface treatment of sapphire. Background technique [0002] Sapphire has excellent mechanical properties, thermal stability and optical properties, and is a widely used material. However, the refractive index of sapphire (~1.7) is much larger than that of air, resulting in a large reflectivity of light at the interface between sapphire and air, which seriously affects the optical performance of sapphire. At present, the methods for improving the optical properties of sapphire are mainly divided into two categories: one is surface coating, usually a multilayer film; the other is surface microstructuring. Surface coating has problems such as few choices of film systems and difficulty in matching between different films, while the design of surface microst...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/08
CPCC23C14/0036C23C14/083C23C14/35
Inventor 姚正军徐尚君周金堂方超
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com