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Zirconium gem processing technology and zirconium gem

A processing technology and technology of zirconium gemstones, applied in the field of zirconium gemstone processing technology and zirconium gemstones, can solve problems such as difficult manufacturing, complex structure, poor refractive index, etc., and achieve the effect of improving the scope of application, clear imaging, and strong anti-scratch effect

Active Publication Date: 2016-06-15
WENLING MODERN CRYSTAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the above-mentioned solution fails to solve the above-mentioned technical problems. In addition, its structure is complicated and difficult to manufacture, and its refractive index is relatively poor.

Method used

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  • Zirconium gem processing technology and zirconium gem

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] Such as figure 1 As shown, the zircon gemstone processing technology comprises the following steps:

[0040] A, material preparation: prepare zircon gemstone body 1, ZrO2 material, SiO2 material and AF material;

[0041] B. Vacuuming: Put the zircon gemstone body 1 into the coating chamber umbrella stand, close the door to vacuumize, and then rotate the workpiece plate, the coating chamber is vacuumed at room temperature and the vacuum degree in the coating chamber after the coating chamber is vacuumed 8.0E-4Pa;

[0042] C. Coating layer: Put ZrO2 material, SiO2 material and AF material into the corresponding evaporation source respectively, the evaporation source is connected with the coating cavity, and the corresponding evaporation source respectively plate ZrO2 material, SiO2 material and AF material in turn through the evaporation process On the zircon gem body 1, that is, on the zircon gem body 1, form ZrO Material coating layer 2, SiO Material coating layer 3 a...

Embodiment 2

[0056] The structure and principle of this embodiment are basically the same as those of Embodiment 1, so they will not be repeated here. The difference lies in:

[0057] The specific evaporation process conditions of ZrO2 material coating layer 2 are: ZrO2 material is under the condition that normal temperature and vacuum degree are 8.0E-4Pa, and the pass rate is Evaporate, the evaporation time is 40s;

[0058] The specific evaporation process conditions of SiO2 material coating layer 3 are: SiO2 material is under the condition that normal temperature and vacuum degree are 8.0E-4Pa, and the pass rate is Evaporate, the evaporation time is 90s;

[0059] The specific evaporation process conditions of the AF material coating layer 4 are: the AF material is at room temperature and the vacuum degree is 8.0E-4Pa, and the flow rate is Evaporate for 20s.

Embodiment 3

[0061] The structure and principle of this embodiment are basically the same as those of Embodiment 1, so they will not be repeated here. The difference lies in:

[0062] The specific evaporation process conditions of ZrO2 material coating layer 2 are: ZrO2 material is under the condition that normal temperature and vacuum degree are 8.0E-4Pa, and the pass rate is Evaporate, the evaporation time is 60s;

[0063] The specific evaporation process conditions of SiO2 material coating layer 3 are: SiO2 material is under the condition that normal temperature and vacuum degree are 8.0E-4Pa, and the pass rate is Evaporate, the evaporation time is 110s;

[0064] The specific evaporation process conditions of the AF material coating layer 4 are: the AF material is at room temperature and the vacuum degree is 8.0E-4Pa, and the flow rate is Evaporate for 40s.

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Abstract

The invention relates to a zirconium gem processing technology and a zirconium gem. The zirconium gem processing technology and the zirconium gem solve the problem that design is unreasonable in prior art. The zirconium gem processing technology includes the following steps that A, material preparation is carried out, wherein a zirconium gem body, a ZrO2 material, a SiO2 material and an AF material are prepared; B, vacuumizing is carried out, wherein the zirconium gem body is placed into a coating cavity umbrella stand, a door is closed, vacuumizing is carried out, then a workpiece disc is rotated, a coating cavity is vacuumized at the normal temperature, and the vacuum degree in the coating cavity ranges from 8.0E to 4Pa after the coating cavity is vacuumized; C, coating is carried out, wherein the ZrO2 material, the SiO2 material and the AF material are placed into corresponding evaporator sources, the evaporator sources are communicated with the coating cavity, the ZrO2 material, the SiO2 material and the AF material are sequentially coated to the zirconium gem body by means of the corresponding evaporator sources through an evaporation technology; and D, material taking is carried out, air is led in, the door is opened, and the finished zirconium gem is taken out. The zirconium gem processing technology and the zirconium gem have the beneficial effect that the practicability is high.

Description

technical field [0001] The invention belongs to the technical field of gemstones, and in particular relates to a zirconium gemstone processing technology and zirconium gemstones. Background technique [0002] At present, most of the existing multimedia devices are provided with some touch buttons. Touch keys include fingerprint unlock keys and the like. The existing fingerprint unlocking key will produce fingerprints, stolen goods and imprints, etc. on the fingerprint unlocking key during operation. Secondly, the scratch resistance is low, the service life is short and the practicability is poor. [0003] Chinese Patent Publication No. CN102707356A discloses a manufacturing method of a color filter, a color filter and a display device, and relates to the display field. The manufacturing method of the color filter includes: obtaining a color filter substrate; coating a layer of first photosensitive material on the color filter substrate to form a coating of the first photos...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/08C23C14/10C23C14/12C23C28/00
CPCC23C14/083C23C14/10C23C14/12C23C14/24C23C28/00
Inventor 葛文志
Owner WENLING MODERN CRYSTAL
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