Efficient Ni-S-Mo hydrogen evolution electrode and preparation method thereof
A hydrogen evolution electrode and high-efficiency technology, applied in electrodes, electrolytic coatings, electrolysis processes, etc., can solve the problems of industrial production difficulties and high energy consumption for the preparation of hydrogen evolution electrodes, and achieve the purpose of increasing specific surface area, improving catalytic hydrogen evolution activity, and improving stability. Effect
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Embodiment 1
[0030] (1) Pretreatment of conductive substrate
[0031] Select the trimmed nickel plate. Use 20 mesh and 60 mesh sandpaper to polish the nickel foil, and rinse it with deionized water after polishing. Then the nickel foil is subjected to alkali washing and degreasing. The alkali washing and degreasing step is to put the alkali washing solution in a constant temperature water bath and raise the temperature to 100° C., then put the machined nickel foil into it, and treat it at a constant temperature for 1 hour. Rinse with deionized water afterwards. Alkali lotion formula: 10% sodium hydroxide by mass fraction, 2% sodium carbonate by mass fraction. The degreased nickel foil is pickled again. Soak in acid solution for 30min. The pickling liquid configuration method is to mix concentrated hydrochloric acid and deionized water according to the volume ratio of 1:2. After pickling, rinse the nickel foil with deionized water until the pH is neutral, ready to use.
[0032] (2) Pr...
Embodiment 2
[0043] Step (1) is the same as step (1) in Example 1;
[0044] (2) Preparation of Ni-S electrode by one electrodeposition
[0045] A three-electrode system is used for one deposition. The conductive base processed with step (1) is the working electrode, and the Ni plate is the counter electrode; the composition of the Ni-S plating solution is: thiourea 25g L -1 , nickel sulfate 100g L -1 , nickel chloride 30g·L -1 . The bath temperature is 30°C. During the electroplating process, the current density was 20mA cm -2 , the deposition time is 25min. Rinse with deionized water after electroplating to remove residual plating solution, and obtain Ni-S electrode after natural air drying.
[0046] (3) Preparation of Ni-S / Ni-S-Mo electrode by secondary electrodeposition
[0047] After the Ni-S electrode prepared by the process (2) is obtained, the secondary deposition process is performed again. Continue to use the three-electrode system, with the Ni-S electrode obtained in (2)...
Embodiment 3
[0051] Step (1) is the same as step (1) in Example 1;
[0052] (2) Preparation of Ni-S electrode by one electrodeposition
[0053] A three-electrode system is used for one deposition. The conductive base processed with step (1) is the working electrode, and the Ni plate is the counter electrode; the composition of the Ni-S plating solution is: thiourea 25g L -1 , nickel sulfate 100g L -1 , nickel chloride 30g·L -1 . The bath temperature is 25°C. During the electroplating process, the current density was 30mA cm -2 , the deposition time is 10min. Rinse with deionized water after electroplating to remove residual plating solution, and obtain Ni-S electrode after natural air drying.
[0054] (3) Preparation of Ni-S / Ni-S-Mo electrode by secondary electrodeposition
[0055] After the Ni-S electrode prepared by the process (2) is obtained, the secondary deposition process is performed again. Continue to use the three-electrode system, with the Ni-S electrode obtained in (2)...
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