A graphite deposition device for a chemical vapor deposition furnace

Abstract

The invention provides a graphite deposition device for a chemical vapor deposition furnace, comprising: a solid raw material storage device; a cover plate placed on the top of the solid raw material storage device; an airflow hole is arranged on the cover plate; at least two The deposition mechanism of more than two vertically arranged deposition chambers; the deposition mechanism is arranged on the top of the cover plate, and the cover plate is used as the bottom plate of the deposition mechanism; a partition is arranged between the deposition chambers, and a partition is arranged on the partition There are airflow holes; a dust collection chamber located above the deposition chamber; the bottom of the dust collection chamber communicates with the uppermost deposition chamber through a dust collection channel. The present invention adds partitions in the deposition chamber, divides the entire chamber, makes the thickness of the products deposited in different chambers more uniform, presents a gradient, improves the conversion rate of the product, greatly improves the subsequent processing efficiency, and reduces the Difficulty in processing, improve the overall utilization rate of products, and effectively solve the problem of uneven thickness in the deposition process of large-scale deposition chambers.

Description

Technical field [0001] The invention relates to the technical field of chemical vapor deposition, in particular to a graphite deposition device for a chemical vapor deposition furnace. Background technique [0002] Modern science and technology require the use of a large number of new inorganic materials with different functions. These functional materials must be highly pure, or doped materials formed by deliberately mixing high purity materials with certain impurities. Chemical vapor deposition is a new technology for preparing inorganic materials developed in recent decades. Chemical vapor deposition has been widely used to purify substances, develop new crystals, and deposit various single crystal, polycrystalline or glassy inorganic thin film materials. [0003] Chemical vapor deposition is a vapor growth method for preparing materials. It is to pass one or several compounds and elemental gases containing film elements into the reaction chamber where the substrate is placed, ...

AI Technical Summary

Problems solved by technology

In general chemical vapor deposition systems, the graphite deposition devices used are basically single chambers, that is, only one deposition chamber is set up in the entire deposition system. This single chamber graphite deposition component is more suitable for small furnaces. Convenient, but for furnaces used in large-scale industrial production, in the process of chemical vapor deposition, defects of uneven thickness of products produced in the entire deposition chamber usually appear, which reduces the utilization rate of products and increases the back-end processing difficulty

Moreover, the graphite deposition device using a single chamber not only has relatively high production costs, but also is inconvenient to operate, resulting in low production efficiency

[0006] Therefore, how to obtain a graphite deposition device for a chemical vapor deposition furnace, which can overcome the defect of uneven product thickness in the deposition chamber in large-scale industrial production, has always been one of the focuses of common attention of manufacturers and users in the industry.

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