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Phase Mask Switching Device

A phase mask and electronically controlled displacement technology, applied in the field of fiber grating, can solve the problems of difficult to control the relative position accurately, affecting the quality of writing gratings, slow writing gratings, etc., to achieve easy independent storage, good writing quality and repeatability, Horizontal distance consistent effect

Active Publication Date: 2017-05-31
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Usually, when writing a grating, every time the phase mask is changed, the phase mask must be manually placed on a fixed fixture. It should be noted that the grooved surface of the phase mask is close to the side of the optical fiber, and the relative position of the phase plate and the optical fiber is difficult to control. Accurate, if the distance from the optical fiber is too close, the phase plate may be damaged, if it is too far, the speed of writing the grating is too slow, and it must be positioned accurately
Moreover, when writing a fiber grating, the optical fiber must be perpendicular to the reticle of the phase mask, otherwise it will affect the quality of the written grating

Method used

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Embodiment Construction

[0027] The present invention will be further described below in conjunction with the accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0028] One of the implementations, the array type phase mask switching device, such as figure 1 As shown, the composition includes a phase mask fixture 1 , a one-dimensional electronically controlled displacement platform combination 2 and a control system 3 . like figure 2 As shown, the front side of the phase mask fixture 1 is used as a bottom plate, and has a plurality of rectangular grooves 11. The size and depth of the rectangular grooves 11 are determined by the size and thickness of the phase mask 6, and there is a certain size in the middle Rectangular light-transmitting holes 12 are regularly arranged to form an array. The array can be multiple rows and multiple columns, or single row and multiple columns or multiple rows and single column. A group of horizontal grooves on the f...

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Abstract

The invention discloses an arrayed phase mask plate switching device and stepped phase mask plate switching device for etching gratings according to a phase mask plate writing method. The stepped phase mask plate switching device comprises a phase mask plate fixture or a phase mask plate fixture combination, two one-dimensional electric control displacement platforms, a transfer frame and a control system. Compared with the prior art, the arrayed phase mask plate switching device and stepped phase mask plate switching device have the advantages that the operation during etching of the optical fiber gratings is greatly simplified, the optical fiber gratings can be automatically etched, and the quality and the repeatability of grating etching can be improved.

Description

technical field [0001] The invention relates to an optical fiber grating, in particular to a phase mask switching device for writing a grating with a phase mask writing method. Background technique [0002] With the wide application of fiber Bragg grating in the fields of coherent optical communication, sensing and fiber laser, the demand for fiber Bragg grating is also increasing. Therefore, the automatic control of fiber Bragg grating writing is conducive to the mass production of fiber Bragg grating. Current methods of writing fiber gratings include the following: [0003] Standing wave interferometry was used in the early days. Its device is relatively simple, requiring a high content of germanium, a small core diameter, and the reflection wavelength of the grating is only determined by the wavelength of the writing light. The conditions for forming the grating are harsh, and the yield is low. It meets the practical requirements and is rarely used. [0004] Transverse ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G02B6/02
Inventor 叶青王迪李璇皮浩洋陈高庭蔡海文
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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