Novel silk fabric dry cleaning fluid and preparation method thereof
A technology of silk fabrics and dry cleaning liquid, which is applied in the field of daily necessities, can solve the problems of no re-pollution resistance and poor detergency of silk fabrics, and achieve good anti-re-infection effects
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0011] A new type of dry cleaning solution for silk fabrics, containing the following components in parts by mass: 24 parts of hydroxyethyldimethylstearyl ammonium p-toluenesulfonate, 1.8 parts of xylene, 0.6 part of lauric acid diethanolamide, triethylene glycol 5 parts, 6 parts of dioctyl sodium sulfosuccinate, 5 parts of light sodium silicate, 1 part of hydrogenated tallow primary amine, 0.5 parts of sodium perborate, 2 parts of sodium chloride, 0.08 parts of methylparaben, Sichuan wax 3 parts, tetrapotassium pyrophosphate 5 parts, water 1 part.
[0012] A preparation method of a novel dry-cleaning liquid for silk fabrics. The preparation steps of the method are as follows: hydroxyethyl dimethyl stearyl ammonium p-toluenesulfonate, xylene, lauric acid diethanolamide, triethylene glycol, dioctyl Sodium sulfosuccinate, light sodium silicate, hydrogenated tallow primary amine, sodium perborate, sodium chloride, methylparaben, Sichuan wax, tetrapotassium pyrophosphate and water...
Embodiment 2
[0014] A new type of dry-cleaning liquid for silk fabrics, containing the following ingredients in parts by mass: 36 parts of hydroxyethyl dimethyl stearyl ammonium p-toluenesulfonate, 5 parts of xylene, 1.3 parts of lauric acid diethanolamide, triethylene glycol 13 parts, 15 parts of dioctyl sodium sulfosuccinate, 13 parts of light sodium silicate, 4 parts of hydrogenated tallow primary amine, 3 parts of sodium perborate, 5 parts of sodium chloride, 0.18 parts of methylparaben, Sichuan wax 7 parts, tetrapotassium pyrophosphate 10 parts, water 5 parts.
[0015] A preparation method of a novel dry-cleaning liquid for silk fabrics. The preparation steps of the method are as follows: hydroxyethyl dimethyl stearyl ammonium p-toluenesulfonate, xylene, lauric acid diethanolamide, triethylene glycol, dioctyl Sodium sulfosuccinate, light sodium silicate, hydrogenated tallow primary amine, sodium perborate, sodium chloride, methylparaben, Sichuan wax, tetrapotassium pyrophosphate and w...
Embodiment 3
[0017] A new type of dry-cleaning liquid for silk fabrics, containing the following components in parts by mass: 28 parts of hydroxyethyl dimethyl stearyl ammonium p-toluenesulfonate, 2.3 parts of xylene, 0.9 part of lauric acid diethanolamide, triethylene glycol 7 parts, 8 parts of dioctyl sodium sulfosuccinate, 8 parts of light sodium silicate, 1.5 parts of hydrogenated tallow primary amine, 1 part of sodium perborate, 3 parts of sodium chloride, 0.1 part of methylparaben, Sichuan wax 4 parts, tetrapotassium pyrophosphate 7 parts, water 2 parts.
[0018] A preparation method of a novel dry-cleaning liquid for silk fabrics. The preparation steps of the method are as follows: hydroxyethyl dimethyl stearyl ammonium p-toluenesulfonate, xylene, lauric acid diethanolamide, triethylene glycol, dioctyl Sodium sulfosuccinate, light sodium silicate, hydrogenated tallow primary amine, sodium perborate, sodium chloride, methylparaben, Sichuan wax, tetrapotassium pyrophosphate and water ...
PUM
![No PUM](https://static-eureka-patsnap-com.libproxy1.nus.edu.sg/ssr/23.2.0/_nuxt/noPUMSmall.5c5f49c7.png)
Abstract
Description
Claims
Application Information
![application no application](https://static-eureka-patsnap-com.libproxy1.nus.edu.sg/ssr/23.2.0/_nuxt/application.06fe782c.png)
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com