Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Base plate layered pouring method for reducing gushing risk confined water under high confined water head

A layered pouring and pressurized water technology, which is applied to underwater structures, buildings, water conservancy projects, etc., to reduce adverse effects, shorten the time for reducing pressurized water, and reduce the risk of groundwater inrush

Inactive Publication Date: 2015-08-12
CHINA CONSTR EIGHT ENG DIV CORP LTD
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to solve the deficiencies and defects of the prior art, the present invention provides a floor-by-layer pouring method for reducing the risk of pressurized water inrush under high pressurized water head, so as to solve the problems existing in the prestressed anchor cable construction method in the prior art

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Base plate layered pouring method for reducing gushing risk confined water under high confined water head
  • Base plate layered pouring method for reducing gushing risk confined water under high confined water head
  • Base plate layered pouring method for reducing gushing risk confined water under high confined water head

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0019] It should be noted that the structures, proportions, sizes, etc. shown in the drawings attached to this specification are only used to match the content disclosed in the specification, for those who are familiar with this technology to understand and read, and are not intended to limit the present invention Therefore, it has no technical substantive meaning, and any modification of structure, change of proportional relationship ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a base plate layered pouring method for reducing a gushing risk confined water under a high confined water head. The method comprises: (1), a foundation trench is excavated to a base plate area, wherein at least one deep trench area is formed in the base plate area range; (2), precipitation is carried out during the foundation trench excavation process; (3), a deep trench base plate for preventing gushing of confined water is poured at the deep trench area; (4), after the deep trench area pouring is completed and a set strength is realized, precipitation is stopped; and (5), a foundation trench base plate is poured. According to the invention, the method has the following advantages: ballasting can be formed after deep trench base plate construction is completed, thereby reducing the gushing risk of underground water at the deep trench area; after completion of the deep trench base plate construction, continuous precipitation on the confined aquifer can be stopped, thereby shortening time for confined water dewatering and reducing the adverse influence on buildings around the foundation trench by the foundation trench excavation.

Description

technical field [0001] The invention relates to a construction method of a building structure, in particular to a bottom plate layered pouring method for reducing the risk of a pressurized water inrush under a high pressurized water head. Background technique [0002] Such as figure 1 As shown, in the prior art, the floor area 11 at the bottom of the basement excavation usually includes the pit area 10 . The interior of the soil layer at the bottom of the foundation pit usually contains a confined aquifer 12, and the confined aquifer 12 has the risk of bursting into the interior of the foundation pit. In order to reduce the inrush risk of the confined aquifer, groundwater needs to be pumped during the excavation of the floor area 11 to lower the water head of the confined aquifer 12 by a second height. During the excavation of the deep pit area 10, groundwater needs to be pumped to lower the water head of the confined aquifer by a first height. During the construction of ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): E02D29/05E02D31/00
Inventor 朱健张毅民侯海芳程翰翔
Owner CHINA CONSTR EIGHT ENG DIV CORP LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com