Etching liquid capable of effectively retarding galvanic effect

A Giavani effect and etchant technology, applied in the field of etchant that can effectively slow down the Giavani effect, can solve the problems of high-frequency and high-speed applications that cannot load consumer electronics

Inactive Publication Date: 2015-06-03
E CHEM ENTERPRISE CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] In addition, due to the high popularity of consumer electronic products such as smartphones and tablet computers, printed circuit boards that traditionally use copper wires as signal transmission can no longer bear the high-frequency and high-speed applications of the above-mentioned consumer electronic products; therefore, copper / gold hybrid Printed circuit boards were then proposed and used in consumer electronics products such as the above

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  • Etching liquid capable of effectively retarding galvanic effect
  • Etching liquid capable of effectively retarding galvanic effect
  • Etching liquid capable of effectively retarding galvanic effect

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Embodiment Construction

[0054] In order to more clearly describe an etching solution proposed by the present invention that can effectively mitigate the Giavani effect, preferred embodiments of the present invention will be described in detail below with reference to the drawings.

[0055] The etchant that can effectively slow down the Giavanni effect of the present invention is applied to a substrate comprising at least one first metal and at least one second metal in a wet etching manufacturing process; wherein, due to the reduction potential of the first metal (Reduction Potential) is greater than the reduction potential of the second metal, therefore, the first metal can be gold (Au), platinum (Pt), silver (Ag), copper (Cu), tin (Sn), nickel (Ni), and aluminum (Al); and correspondingly, the second metal can be aluminum (Al), nickel (Ni), tin (Sn), copper (Cu), silver (Ag), platinum (Pt), titanium (Ti) , iron (Fe), cobalt (Co) and chromium (Cr); as for the substrates, they are common printed circu...

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Abstract

The invention relates to an etching liquid capable of effectively retarding a galvanic effect. The etching liquid is mainly prepared by dissolving an etchant and a nitrogen-containing pentabasic heterocyclic compound with a specific ratio into water. Therefore, when a substrate containing at least one first metal (for example, gold) and at least one second metal (for example, copper) is subjected to wet etching by a user with the etching liquid, the nitrogen-containing pentabasic heterocyclic compound can form an organic protective film on the first metal with relatively reduction potential, so as to effectively avoid the phenomenon of excessive etching caused by the effects on the second metal caused by the galvanic effect. A chemical structure of the nitrogen-containing pentabasic heterocyclic compound is shown in a chemical formula 1; and the chemical formula 1 is as shown in the specification.

Description

technical field [0001] The invention relates to an etching solution, in particular to an etching solution containing a nitrogen-containing five-membered heterocyclic compound and capable of effectively slowing down the Giavani effect. Background technique [0002] In the back-end manufacturing process of printed circuit boards or integrated circuits, in order to make metal layers (that is, wires or soldering pads) with specific patterns on printed circuit boards or silicon wafers, photolithography is usually used to Etching technology is completed with a specific etching solution, for example: ferric chloride is an etching solution, copper chloride is an etching solution, alkaline etching solution, etc. However, these etching solutions have a problem called undercut. [0003] see figure 1 and figure 2 , is a schematic diagram of the manufacturing process for making a copper layer with a specific pattern on a printed circuit board. In the general copper wire manufacturin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/44
Inventor 蔡政颖廖程楷徐素斐
Owner E CHEM ENTERPRISE CORP
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