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A fast-changing target single-sided reciprocating continuous coating magnetron sputtering roll-to-roll coating machine

A magnetron sputtering and coating machine technology, which is applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc., can solve the problems of continuous sputtering three-layer dielectric film, sputtering time and sputtering atmosphere , Electricity and other resources use more problems, to achieve the effect of simplifying electrical control devices and procedures, saving time and energy, and convenient control

Active Publication Date: 2017-01-25
常州常工院技术转移有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the cathode sputtering film-forming device, the winding-type vacuum coating equipment can obviously improve the film-forming efficiency because of its continuous production. However, in the existing winding-type vacuum coating equipment, for each The number of membrane cathode chambers installed is limited, the sputtering time and sputtering atmosphere of each cathode chamber are difficult to accurately control, and the stability of film formation is poor. Most of them can only produce one or two layers of dielectric films, but cannot continuously sputter three layers of dielectric films. , because the sputtering film-forming time of the dielectric film in the middle of the three-layer dielectric film is longer, and the film-forming atmosphere is different from the atmosphere of the upper and lower dielectric films. The existing winding-type vacuum coating equipment rotates synchronously, and the single cathode chamber The time for sputtering to form a film is obviously not enough, and the atmosphere in each cathode chamber is easy to interfere with each other; in addition, the existing winding-type vacuum coating equipment often needs to be used in conjunction with a cleaning device, a heating device, and an unwinding and winding mechanism to form a production line. It will cause a lot of equipment and occupy a large production area
[0005] In addition, the existing coating machine needs to replace the cathode target after a coating is completed, and the target replacement is carried out by opening the vacuum chamber, so that before continuing to coat, it is necessary to recreate the vacuum and other process conditions, which not only prolongs the processing time. cycle, and more resources such as electricity are used, which is not conducive to achieving high efficiency and low cost of coating

Method used

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  • A fast-changing target single-sided reciprocating continuous coating magnetron sputtering roll-to-roll coating machine
  • A fast-changing target single-sided reciprocating continuous coating magnetron sputtering roll-to-roll coating machine
  • A fast-changing target single-sided reciprocating continuous coating magnetron sputtering roll-to-roll coating machine

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Embodiment

[0036] like figure 1 As shown, a magnetron sputtering roll-to-roll coating machine for rapid target-changing single-sided reciprocating continuous coating in this embodiment includes a vacuum chamber 1, an unwinding mechanism 2, a cooling roller 6, and a winding mechanism sequentially arranged in the vacuum chamber 1 7, and the cathode cell 9 located below the cooling roller 6, also includes a deviation correction device 3 and a return conversion target device 8 located below the cathode cell 9, and the base tape between the unwinding mechanism 2 and the winding mechanism 7 passes through the reversing roller 5 Covered on the cooling roller 6 after reversing, and the base belt is also provided with a tension roller 19, the tension roller 19 is connected with the torque motor for real-time adjustment of the tension of the base belt, the unwinding mechanism 2, the winding mechanism 7 and the cooling The three rollers 6 are synchronously linked. During the coating process, the co...

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Abstract

The invention discloses a magnetron sputtering winding coating machine capable of exchanging target quickly and coating film continuously in reciprocating mode, and belongs to the field of coating equipment. The magnetron sputtering winding coating machine comprises a vacuum chamber, an unwinding mechanism, a cooling roller, a winding mechanism, a cathode small chamber, deviation rectifying devices and a rotating target-exchanging device; the unwinding mechanism and the winding mechanism are provided with a group of deviation rectifying devices, respectively; the cooling roller, the cathode small chamber and the rotating target-exchanging device are arranged on the same axis; the rotating target-exchanging device comprises a machine seat, a rotating disk, an axial telescoping mechanism, two or more telescopic shaft sleeve, a polar target seat plate and a radial telescoping mechanism; after the axial telescoping mechanism shrinks, the radial telescoping mechanism is located below one telescopic shaft sleeve; the unwinding mechanism and the winding mechanism drive a base belt to reciprocate. The cathode target can be exchanged quickly without opening the vacuum chamber, the continuous coating of a plurality of film layers is realized by the reciprocating motion of a substrate, each layer of film can be coated independently, the parameters of the film layer are convenient to control; and the equipment structure is compact.

Description

technical field [0001] The invention relates to a vacuum coating machine, in particular to a single-sided reciprocating continuous coating magnetron sputtering winding coating machine for rapid target change. Background technique [0002] The vacuum coil coating technology is a technology of preparing one or more layers of thin films with certain functions on the surface of the coil substrate by thermal evaporation or magnetron sputtering in a vacuum chamber. The vacuum winding coating equipment mainly has the following characteristics: First, the substrate to be plated is a flexible substrate, that is, it can be rolled; second, the coating process is continuous, that is, the coating is carried out continuously within a working cycle; Third, the coating process is carried out in a high vacuum environment. During the unwinding and rewinding process of the winding coating machine, the surface of the substrate is coated with a thin film. The structure of the coating is the wor...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/56C23C14/35
Inventor 朱锡芳徐安成杨辉许清泉陈功
Owner 常州常工院技术转移有限公司
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