A Graded Ridge Waveguide Distributed Feedback Laser with High Single-Mode Yield
A distributed feedback and distributed feedback technology, applied in the field of lasers, can solve the problems of long laser cavity, high threshold, low diffraction efficiency of second-order grating, etc., and achieve the effect of improving single-mode yield and solving low yield.
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Embodiment 1
[0059] figure 1 It is a schematic structural diagram of an AlGaInAs / InP DFB semiconductor laser with an operating wavelength of 1310 nm. The laser has a resonator, and the resonator includes from bottom to top: substrate, buffer layer, first barrier layer, first separate confinement layer, quantum well active region, second separate confinement layer, second barrier layer, second A spacer layer and a second spacer layer; a grating layer in which the Bragg grating is located between the first spacer layer and the second spacer layer. The resonant cavity has a laser output end face, and the cavity length direction of the resonant cavity is perpendicular to the laser output end face.
[0060] figure 1 Among them, 1 and 13 are the contact layer, which is used to contact the metal of the electrode layer to reduce the resistance of the electrical connection, etc. The material of the contact layer is In 0.53 Ga 0.47 As, the thickness of the contact layer is 200nm; the contact lay...
Embodiment 2
[0068] image 3 It is a schematic diagram of the structure of the 1310nm AlGaInAs / InP DFB semiconductor laser with the grating layer in the ridge, 1 and 13 in the figure are the contact layer; 2 is the substrate; 3 is the buffer layer, the material is InP, and the thickness is 500nm; are the first and second barrier layers, and the material is In 0.52 Al 0.48 As, with a thickness of 50nm; 5 and 7 are the first and second confinement layers respectively, the material is InAlGaAs, and their thickness is 100nm; 6 is the quantum well active region, which is composed of 8 well layers and 9 barrier layers cross-stacked , the material of each well layer is In 0.69 Al 0.16 Ga 0.15 As, the thickness is 5.5nm, and the material of each barrier is In 0.52 Al 0.35 Ga 0.13 As, the thickness is 9nm; 9 is the spacer layer; 10 is the grating layer, and its material is In 0.79 Ga 0.21 As 0.46 P 0.54 , the thickness is 30nm, the grating period is 204.7nm, the material is InP, and the ...
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