Compound photocatalyst for treating wastewater pollution as well as preparation method and application of compound photocatalyst
A technology of composite light and catalyst, applied in the field of photocatalysis, can solve the problem of low photocatalytic efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0100] (1) CdLa 2 S 4 sample preparation
[0101] (1-1) 2.3799g Cd(NO 3 ) 2 ·4H 2 O, 6.6896g La (NO 3 ) 3 ·6H 2 O and 2.5365g of thiourea were placed in 60mL of distilled water, the obtained solution was added to a stainless steel autoclave with a 100mL capacity polytetrafluoroethylene substrate, and a constant temperature reaction was performed at 433K (about 160°C) for 72h to obtain a yellow precipitate,
[0102] (1-2) Rinse the yellow precipitate obtained in step (1-1) with absolute ethanol, and vacuum dry it at 333K (about 60°C) to obtain CdLa 2 S 4 sample;
[0103] (1') Pretreatment of SiC
[0104] (1'-1) The SiC powder was calcined in a muffle furnace at 973K (about 700°C) for 3 hours, and then immersed in a 2% HF solution for 5 hours.
[0105] (1'-2) The solution was suction filtered, rinsed with distilled water for 3 times, and finally dried at 393K (about 120°C) for 12h to obtain a SiC sample;
[0106] (2)SiC / CdLa 2 S 4 Preparation of catalyst samples
...
Embodiment 2
[0110] The method used in this example is the same as that in Example 1, except that 0.005g of SiC is added in step (2-1) to prepare the composite catalyst sample SiC / CdLa 2 S 4 The weight fraction of SiC is 1.0%.
Embodiment 3
[0112] The method used in this example is the same as that in Example 1, except that 0.010 g of SiC is added in step (2-1) to prepare the composite catalyst sample SiC / CdLa 2 S 4 The weight fraction of SiC is 2.0%.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com