Fin field effect transistor and method of forming the same
A fin field effect and transistor technology, which is applied in the fields of semiconductor devices, semiconductor/solid state device manufacturing, electrical components, etc., can solve the problems of serious self-heating effect of fin field effect transistors, so as to solve the serious self-heating effect and eliminate the right angle Corner, width reduction effect
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[0040] As mentioned in the background art, because the upper surface of the existing fin field effect transistor is flat, and there is a vertical corner between the upper surface and the side surface, on the one hand, the overall width of the fin structure of the fin field effect transistor is large, It is difficult to dissipate heat. On the other hand, the parasitic resistance of the channel area formed inside the fin structure is large, which leads to serious heating effects when the current passes through the channel area. Two reasons lead to the self-heating of the existing fin field effect transistor. The effect is serious, so that the fin field effect transistor has serious reliability problems.
[0041] To this end, the present invention provides a method for forming a Fin Field Effect Transistor, in which a semiconductor-on-insulator semiconductor layer is patterned to form a fin structure, and then a mask layer is formed in the middle of the upper surface of the fin st...
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