Panel display substrate glass composition
A flat-panel display and substrate technology, which is applied in the field of alkaline earth aluminoborosilicate glass components, can solve the problems of toxicity, low temperature of clarified gas, and low effectiveness of glass bubbles, and achieves environmental friendliness, low melting temperature, and reduced melting temperature. Effect
Inactive Publication Date: 2015-01-14
TUNGHSU GRP
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[0035] The present invention will be further described below with specific examples.
[0036] Table 1 shows the specific formulations of the substrate glasses in Examples 1 to 9, and also contains a comparative example, which is used to compare and illustrate the performance of the glass of the present invention.
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Abstract
The invention discloses a panel display substrate glass composition which comprises the following components in percentage by weight: 56-65% of SiO2, 15-24% of Al2O3, 4-6.5% of B2O3, 3-8% of MgO, 3-10% of CaO, 0.1-6% of SrO, 0.01-5% of Y2O3 and 0.01-4% of La2O3. By adopting the technical scheme, the composition has the following advantages: the thermal expansion coefficient at 50-380 DEG C is 28-37*10<-7> / DEG C, the strain point is higher than 720 DEG C, the density is less than 2.55 g / cm<3>, and the liquidus temperature is lower than 1150 DEG C. The panel display glass substrate is environment-friendly and stable in performance, and has important functions on enhancing the production yield, reducing the energy consumption and controlling the cost.
Description
technical field [0001] The invention relates to an alkaline earth aluminoborosilicate glass component, which can be widely used in the production of glass substrates for flat-panel displays, and is especially suitable for low-temperature polysilicon thin-film transistor liquid crystal display (LTPS TFT-LCD) substrate glass and organic electroluminescence displays (OEL) substrate glass. Background technique [0002] With the rapid development of the flat panel display industry, the demand for various display devices is increasing, such as active matrix liquid crystal display (AMLCD), organic light emitting diode (OLED) and active matrix liquid crystal display (LTPS TFT) using low temperature polysilicon technology. -LCD) devices, these display devices are based on the use of thin-film semiconductor materials to produce thin-film transistor (TFT) technology. At present, TFT can be divided into amorphous silicon (a-Si) TFT, polycrystalline silicon (p-Si) TFT and single crystal...
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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/095
CPCC03C3/095
Inventor 张广涛闫冬成田颖刘文泰李兆廷
Owner TUNGHSU GRP
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