Particle monitoring method of wet cleaning process apparatus
A technology of process equipment and wet cleaning, which is applied in the fields of electrical components, semiconductor/solid-state device manufacturing, circuits, etc., and can solve problems such as difficulty in taking into account high sensitivity and accuracy
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[0024] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be described in detail below with reference to specific embodiments and drawings.
[0025] The method for monitoring particles of wet cleaning process equipment according to a preferred embodiment of the present invention includes: immersing a part of the wafer area of the wafer in the chemical solution of the acid tank, and making another part of the wafer area of the wafer expose the chemical in the acid tank. Liquid (that is, not immersed in the chemical liquid); cleaning a part of the wafer area immersed in the chemical liquid in the acid tank by simulating the cleaning process; after performing the cleaning, the entire wafer (that is, the part of the wafer area and the The other part of the wafer area) performs a thin film growth process; after the thin film growth process is performed, defects on the wafer are detected, and the wet proc...
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