Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Nanoimprinting method and device of array type micro-structure

A nano-imprinting and micro-structure technology, applied in the fields of nanotechnology, optics, opto-mechanical equipment, etc., can solve the problems of low processing efficiency, and achieve the effect of fast heating speed, accurate construction and precise control of heating area.

Inactive Publication Date: 2014-12-10
SUZHOU UNIV
View PDF0 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The main disadvantage of the existing method is that the processing efficiency is low, and the photoresist needs to be precisely exposed, which has high requirements for the operation accuracy of the process and equipment, and is subject to many restrictions in practical applications.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nanoimprinting method and device of array type micro-structure
  • Nanoimprinting method and device of array type micro-structure
  • Nanoimprinting method and device of array type micro-structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] PMMA is used as the processing substrate, and the metal nickel material grating with a line width of 500nm is used as the needle tip indenter, and the microstructure grating array template is processed by the needle nanoimprinting method.

[0052] Specifically, the processing substrate is fixed on the workbench, and the imprinting surface of the microstructure mold having the above-mentioned needlepoint indenter is controlled to be in contact with the area to be processed; the heating laser is turned on, and the laser beam is focused and irradiated on the surface of the embossing surface , the focal spot size is 200um, the surface temperature rises through energy radiation, and the surface processing temperature is about 200°C.

[0053] When the surface temperature of the embossed surface reaches the processing temperature of the substrate, the embossing pressure is applied to the imprinted surface of the microstructure mold, and the pressure is maintained to promote the s...

Embodiment 2

[0057] The PC is used as the processing base material, the silicon material device with the square boss structure is used as the pinpoint indenter, and the template of the nano pit of the Fabry-Perot optical resonant cavity is processed by the pin nanoimprinting method.

[0058] Specifically, the processing substrate is fixed on the workbench, and the imprinting surface of the microstructure mold having the above-mentioned needlepoint indenter is controlled to be in contact with the area to be processed; the heating laser is turned on, and the laser beam is focused and irradiated on the surface of the embossing surface , the focal spot size is 500um, the surface temperature rises through energy radiation, and the surface processing temperature is about 250°C.

[0059] When the surface temperature of the embossed surface reaches the processing temperature of the substrate, the embossing pressure is applied to the embossed surface of the microstructure mold, and the pressure is m...

Embodiment 3

[0063] The PMMA-MA copolymer is used as the processing substrate, and the metal nickel material grating with a line width of 600nm is used as the needle tip indenter, and the needle nanoimprinting method is used to process the holographic pattern template with a specific pattern.

[0064] Specifically, the processing substrate is fixed on the workbench, and the imprinting surface of the microstructure mold having the above-mentioned needlepoint indenter is controlled to be in contact with the area to be processed; the heating laser is turned on, and the laser beam is focused and irradiated on the surface of the embossing surface , the focal spot size is 100um, the surface temperature rises through energy radiation, and the surface processing temperature is about 180°C.

[0065] When the surface temperature of the embossed surface reaches the processing temperature of the substrate, the embossed surface of the microstructure mold is controlled to apply embossing pressure, and th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
depthaaaaaaaaaa
Login to View More

Abstract

The invention discloses a nanoimprinting method and device of an array type micro-structure. The nanoimprinting method of the array type micro-structure comprises the following steps: 1, conveying a base material to a processing station; 2, enabling the imprinting surface of a mould to be in contact with the base material; 3, irradiating the imprinting surface of the mould by laser and heating; 4, imprinting; 5, demoulding; 6, conveying the base material to the next processing station; and 7, repeating the steps 2-5. According to the nanoimprinting method and device of the array type micro-structure, disclosed by the invention, rapid heating and cooling of a local tiny region is realized by virtue of irradiation of the laser to transmit power; by adjusting parameters of an optical aligning and focusing system, the heating effect of regions of different sizes is realized; by adjusting the laser power, the accurate control of the processing temperature of the base material is realized; by adjusting the irradiation time of the laser, the perfect filling of the base material is realized, and the advantages that the heating speed is high, the tiny region to be heated is accurately controlled, the temperature field gradient is accurately constructed and the like are achieved.

Description

technical field [0001] The invention relates to the field of nanoimprinting manufacturing of arrayed optical microstructures, in particular to a nanoimprinting method and device for arrayed microstructures. Background technique [0002] The template manufacturing with randomly distributed arrayed holographic patterns is the key to laser anti-counterfeiting technology and special pattern printing technology. . The industry urgently needs an array microstructure processing method with low cost and fast processing performance to realize the industrial application of template manufacturing. [0003] The existing processing methods mainly include: point-by-point laser direct writing technology, interference lithography technology and electron beam direct writing technology. The basic idea of ​​the existing processing method is to use the optical exposure technology based on laser or high-energy particle beam, combined with the point-by-point motion scanning device, to realize t...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00B82Y40/00
Inventor 刘楠刘曰涛刘吉柱陈涛孙立宁
Owner SUZHOU UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com