Remote plasma system having self-management function and self management method of the same

Abstract

A remote plasma system having a self management function of the present invention measures an operating state of a remote plasma generator while a remote plasma generator operates, which generates plasma and remotely supplies the generated plasma to a process chamber, thereby allowing a process manager to check the measured operating state and performing a required process control depending on an operating state. According to the remote plasma system having the self management function of the present invention, it is possible to check operating state information of the remote plasma generator in real time so as to judge whether the remote plasma generator normally operates and immediately sense occurrence of an error during the operation. Further, it is possible to check in real time the operating state information of the remote plasma generator and plasma treatment process progress state information in the process chamber while the plasma generated from the remote plasma generator is supplied to the process chamber. Therefore, a process manager can determine an operating state of the remote plasma system in real time and immediately cope with an abnormal operation when the abnormal operation occurs. Further, the process manager can determine the system in real time at the time when maintenance of the system is required, thereby increasing maintenance efficiency.

Description

technical field [0001] The present invention relates to a plasma processing system, in particular to a remote plasma system. After the plasma generated by a remote plasma generator is supplied in a remote manner, the plasma processing flow is executed in a process chamber. Background technique [0002] Plasma discharges are used for gas excitation to generate reactive gases including ions, radicals, atoms and molecules. Reactive gases are widely used in many fields, and the most representative examples are etching, evaporation, cleaning, polishing, etc. in semiconductor manufacturing engineering. [0003] A remote plasma generator is a device for generating plasma outside a process chamber to remotely supply it to the process chamber. The most representative semiconductor manufacturing processes using remote plasma generators include the cleaning process for cleaning the interior of the process chamber, and the polishing process for removing the photoresist layer evaporated...

AI Technical Summary

Problems solved by technology

However, to date, remote plasma generators have not been able to provide appropriate reminders of their equipment status and process status

So it's hard to make timely repairs at the right time

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