Multiplying power adjustment method of wide spectral line projection optical system

Abstract

The invention discloses a multiplying power adjustment method of a wide spectral line projection optical system. The multiplying power adjustment method includes the following steps: providing the reduced wide spectral line projection optical system which approaches to a telecentric optical path at object space and image space, wherein the wide spectral line projection optical system sequentially comprises a first lens set with the positive focal power, a variable-aperture diaphragm, a second lens set and a third lens set with the positive focal power from an object plane to an image plane, the second lens set meets the condition that vd=(nd-1) / (nF-nC) and comprises at least two positive lenses smaller than 1.65 in nd and larger than 65 in vd and at least two negative lenses larger than 1.50 in nd and smaller than 55 in vd, in the third lens set, the lens closest to the image plane is a negative lens, the negative lens has a concave face facing the image plane and meets the condition that the nd is smaller than 1.66, the vd is larger than 58, and ri / ti is larger than 0.6 and smaller than 5.0, and the lens sets meet the condition that f1 / L is larger than 0.05 and smaller than 1.3, |f2| / L is larger than 0.3, and f3 / L is larger than 0.03 and smaller than 0.8; adjusting the displacement of the lenses in the first lens set to adjust the projection multiplying power of the optical system.

Description

technical field [0001] The present invention relates to a method for adjusting the magnification of an optical system of a lithography device for micromachining, in particular to a method for adjusting a magnification of a projection optical system, the projection optical system is mainly used in micro-electromechanical systems (MEMS, Micro-Electro-Mechanical System), photolithography systems such as semiconductors, solar cells, liquid crystals, printed circuit boards, and projection optical systems for photolithography. Background technique [0002] With the development of projection lithography technology, the performance of the projection optical system is gradually improved, and the projection optical system can already be applied to various fields of microfabrication. High-yield projection optical systems are in increasing demand. When using a broad-spectrum light source such as a mercury lamp, it is desirable to use as many characteristic lines as possible at the same...

AI Technical Summary

Problems solved by technology

The secondary spectrum of axial chromatic aberration is not fully corrected, and only the spectral g-line and i-line can be used, which is difficult to meet the yield requirements

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