Light path precise adjusting and converting device in ultra-high vacuum test cavity

Abstract

The invention discloses a light path precise adjusting and converting device in an ultra-high vacuum test cavity to evaluate a multi-cavity reflector set through the same light source, and belongs to the technical field of optics under the ultra-high vacuum environment. The device comprises an EVU light source, a sample contamination cavity, a gate valve, a light path precise adjusting and converting device, a reflector set vacuum cavity and an exposure cavity. The path precise adjusting and converting device adopted in the ultra-high vacuum environment can accurately adjust and position the spatial position of a reflector by means of the three-point supporting, two-dimension moving and two-dimension rotating and precise-adjustable method, it is ensured that the axis of a reflector rotating shaft system must be concentric and coplanar with the reflecting face of the reflector, an elastic element is arranged on the vertical plane of the rotating shaft system based on the isosceles triangle stability principle, it is ensured that a tension spring hanging nail is located on the extension line of rotating shaft center line, it is ensured that a tension spring can be in the same deformation and stress state before and after converting, and then the reflector can be positioned. The converting device can be operated outside a vacuum tank, and the reflector can be fast switched, positioned and focused.

Description

technical field [0001] The invention relates to an optical path precision adjustment and conversion device in an ultra-high vacuum test chamber, belonging to the field of optical technology in an ultra-high vacuum environment. Background technique [0002] The surface of the optical element in the EUV projection optical system working in an ultra-high vacuum environment is oxidized under the irradiation of EUV light, and there is still C in the cavity x h y , The carbon pollution and oxidation formed by carbon deposition pollution on the surface of the optical element reduces the reflectivity of the optical surface, reduces the output of the system, and also affects the marking uniformity. [0003] In order to improve the surface reflectance of multilayer coatings of optical components in EUV projection optical systems, it is necessary to build a simulated exposure-pollution test device to explore the mechanism of exposure-pollution on the life of EUV multilayer coating opt...

AI Technical Summary

Problems solved by technology

[0002] The surface of the optical element in the EUV projection optical system working in an ultra-high vacuum environment is oxidized under the irradiation of EUV light, and there is still C in the cavity x h y , The carbon pollution and oxidation formed by carbon deposition pollution on the surface of optical components reduces the reflectivity of the optical surface, reduces the output of the system, and also affects the marking uniformity

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