Reticle Transfer System

A technology of transmission system and reticle, which is applied in the direction of photo-plate-making process of pattern surface, photo-plate-making process exposure device, optics, etc., can solve the problems of cumbersome and complicated manipulator movement and control, and achieve the reduction of adjustment resolution and constraint The effect of lowering and facilitating locking

Active Publication Date: 2016-03-02
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage is that the movement and control of the manipulator is relatively cumbersome and complicated

Method used

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Embodiment Construction

[0021] The idea, specific structure and technical effects of the present invention will be further described below in conjunction with the accompanying drawings, so as to fully understand the purpose, features and effects of the present invention.

[0022] figure 1 It is a schematic structural diagram of a reticle transport system in a preferred embodiment of the present invention. Please refer to figure 1 . In this embodiment, the reticle transport system includes a manipulator 101, a plate library 102, and a pre-alignment device 103, which are used to move the reticle along the figure 1 The clockwise direction shown is loaded onto the mask table 104, or along figure 1 The counterclockwise direction shown is unloading the reticle from the mask table 104 .

[0023] In this embodiment, the reticle library 102 is used to store reticles and manage reticle information. The direction in which the reticle is stored in the repository 102 is the same as the direction in which the...

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Abstract

The invention discloses a mask template transmission system used for loading a mask template to a mask table or unloading the mask template from the mask table, and the mask template transmission system comprises a template library, a manipulator and a pre alignment device. The template library is used for storing mask templates. The manipulator takes or places the mask template along the mask template storing direction of the template library, and loads the mask template or unloads the mask template along the mask template loading direction of the mask table. The pre alignment device is arranged on a transmission path of the manipulator to perform pre alignment on the mask template when the mask template is taken out from the template library by the manipulator, and after the pre alignment is completed, the manipulator loads the mask template to the mask table. The mask template storing direction of the template library and the mask template loading direction of the mask table are same, so that the manipulator can straightly go in and straightly go out. By use of the mask template transmission system, the manipulator can straightly go in and straightly go out, so that the arc motion can be avoided, the transmission path is simplified, and the system risk is reduced.

Description

technical field [0001] The invention relates to a transmission system, in particular to a reticle transmission system. Background technique [0002] A lithographic apparatus is a device that exposes a mask pattern onto a silicon wafer. Known lithographic apparatuses include step-and-repeat and step-and-scan. In the above-mentioned lithography equipment, it is necessary to have a corresponding device as a reticle transport system, and the system needs to transfer the reticle with high precision to meet the requirements of lithography. The above-mentioned transfer system for the reticle is called a transfer system. The transmission system is an important part of the lithography equipment. During the high-speed movement of the reticle transported by the transmission system, it is necessary to ensure that the reticle is always reliably positioned and the reticle is safe, that is, the six degrees of freedom of the above-mentioned reticle and silicon wafer are all restricted. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F9/00
Inventor 程永锋王邵玉
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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