Micro polaroid array on basis of metal nanometer optical gratings and preparation method thereof

Abstract

The invention discloses a micro polaroid array on basis of metal nanometer optical gratings and a preparation method thereof. The single-layer micro polaroid array comprises a substrate with high light-admitting quality and the metal nanometer optical gratings on the substrate, wherein the arrangement directions of the metal nanometer optical gratings on the substrate are not identical, one optical grating formed by adjacent metal nanowires which are arranged in the same direction is a micro Polaroid, and the size of each micro polaroid is equal to the pixel size of a photosensitive element chip. Meanwhile, the invention further discloses a preparation method for the single-layer micro polaroid array on the basis of the metal nanometer optical gratings. Accordingly, micro polaroid arrays in different polarization directions can be integrated to the same layer, the problem that light transmittance needed by a micro polaroid array based on multi-layer metal optical gratings in the prior art is not high is solved, the technological processes are simplified, and manufacturing cost is reduced.

Description

technical field [0001] The invention relates to the technical field of micro-polarizer arrays, in particular to a brand-new single-layer micro-polarizer array and its preparation method. Its pixel size and pixel array are matched with the image sensor CCD used, and can be imaged in one exposure. Extract and analyze image information of light intensity and polarization of incident light with arbitrary polarization state, and can perform real-time phase shift analysis. Background technique [0002] The micropolarizer array is a device used to measure the light intensity of each polarization direction after the light passes through the polarizers with different transmission directions. It is usually used in conjunction with an image sensor (such as a digital camera) to obtain the The obtained images of each polarization component can be analyzed in real time. At present, the preparation methods of micropolarizer arrays mainly include polyvinyl alcohol film etching, liquid crys...

AI Technical Summary

Problems solved by technology

This method needs to make two layers of metal nanowire grating arrays successively on one surface, such as figure 1 As shown in a, to achieve four different polarization directions, it is necessary to fabricate four layers of metal nanowire grating arrays, such as figure 1 As shown in b, the manufacturing process of the four-layer metal nanowire grating array is to make a multi-layer micro-polarizer array, and each polarization direction is one layer, which brings two problems: one, the repeated engraving of the silicon dioxide layer Etching and deposition will reduce the transmittance of the required light, and the more the number of layers, the lower the transmittance; second, polarizers with different polarization directions are on different layers, which will reduce the consistency of process parameters, resulting in different polarization directions. Dispersed performance; Third, multiple deposition of aluminum layer and silicon dioxide layer will increase the complexity of the process, reduce the yield and increase the production cost

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