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A film drying method applied to sol coating technology

A drying method and sol technology, applied in liquid chemical plating, metal material coating process, coating and other directions, to achieve the effect of simple operation process, no shrinkage deformation, simple and controllable process

Active Publication Date: 2016-07-20
AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In order to solve the film drying shrinkage problem in the sol-gel process, the invention provides a film drying method that can significantly inhibit the film drying shrinkage and is easy to operate and is applied to the sol coating technology.

Method used

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  • A film drying method applied to sol coating technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] 1) Take a certain mass of vanadyl acetylacetonate and an appropriate volume of ethanol to fully mix and stir, and leave to stand for 5 hours to form a vanadium dioxide coating solution.

[0022] 2) Coating the coating solution described in step (1) on the cleaned glass substrate by spray pyrolysis method.

[0023] 3) Place the glass substrate coated with vanadium dioxide coating solution horizontally figure 1 In the middle of the heating furnace shown, the temperature is rapidly raised to 80°C at a heating rate of 5°C / s, and taken out after holding for 10 minutes to obtain a dry film with almost no shrinkage deformation.

Embodiment 2

[0025] 1) Take a certain quality of zinc acetate and an appropriate volume of ethylene glycol methyl ether, mix and stir thoroughly, and form a zinc oxide coating solution after standing for 5 hours.

[0026] 2) Coating the coating solution described in step (1) on the cleaned silicon wafer substrate by a spin coating method.

[0027] 3) Place the silicon substrate coated with zinc oxide coating solution horizontally figure 1 In the center of the heating furnace shown, the temperature is rapidly raised to 300°C at a heating rate of 10°C / s, and taken out after holding for 1 minute to obtain a dry film with almost no shrinkage deformation.

Embodiment 3

[0029] 1) Take a certain volume of tetraethyl orthosilicate, fully mix and stir with an appropriate volume of water and dilute hydrochloric acid solution, and form a silicon oxide coating solution after standing for 5 hours.

[0030] 2) Coating the coating solution described in step (1) on the cleaned quartz substrate by a pulling method.

[0031] 3) Put the quartz substrate coated with silicon oxide coating solution horizontally into figure 1 In the middle of the heating furnace shown, the temperature is rapidly raised to 200°C at a heating rate of 8°C / s, and taken out after holding for 5 minutes to obtain a dry film with almost no shrinkage deformation.

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Abstract

The invention belongs to the technical field of functional films, and particularly relates to a film drying method applied to a sol film coating technology. The invention develops a film heating and drying process applied to the sol film coating technology. The process is different from a whole surface uniform heating manner for a traditional sol film, directional thermal fields are exerted on the symmetrical left side and right side of the film, and quick temperature rising treatment is utilized, so that larger temperature gradient distribution can be formed on the surface of the film, and finally film formation from the edge to the center of the film gradually is realized. According to the process, shrinkage distortion in the film drying process can be effectively inhibited, the energy consumption is low, the preparation period is short, the process is simple and controllable, no expensive equipment is needed, meanwhile no special requirement is needed on the to-be-prepared film material, the size and the substrate types, and a new technology with low cost and short period and capable of realizing industrialized implementation is provided for the drying process in the sol film coating.

Description

technical field [0001] The invention belongs to the technical field of functional thin films, and in particular relates to a thin film drying method applied to sol coating technology. Background technique [0002] The sol-gel method is a material preparation method developed in the 1960s. Compared with other functional film preparation technologies, the sol-gel method has many advantages such as small product particle size, high uniformity, easy doping, simple equipment and process, and controllable reaction process. The field has attractive application prospects. [0003] The process of preparing thin films by sol-gel method mainly includes: sol preparation, sol aging, coating, drying and heat treatment. Among them, the control of drying process parameters has a crucial influence on the performance of the film (C.J.Brinker, et al., "Fundamentals of sol-geldipcoating", ThinSolidFilms, 1991, 201: 97-108). Due to the gel process of the sol, there is still a large amount of ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C18/12
Inventor 田野刘勇罗飞成波刘大博
Owner AVIC BEIJING INST OF AERONAUTICAL MATERIALS
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