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Method for producing antireflection film, antireflection film, polarizing plate, and image display device

An anti-reflective film and a technology for its manufacturing method are applied in the directions of polarizing elements, optics, instruments, etc., which can solve problems such as poor adhesion, shrinkage of transparent film substrates, and decreased anti-fouling properties, and achieve excellent scratch resistance and Effect of antifouling property and excellent antireflection characteristics

Active Publication Date: 2014-04-30
DAI NIPPON PRINTING CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the layer is formed by vapor deposition, other materials such as adhesive resin cannot be used, and since the layer strength of the antifouling layer or the adhesion to the transparent film substrate deteriorates, several times of wiping will cause The antifouling layer is peeled off from the film and the antifouling performance is significantly reduced. Also, because the evaporation must be carried out at a high temperature of several hundred degrees, there is a transparent film substrate that shrinks due to heating, or accelerates the deterioration of the product before distribution. During the test, there were problems such as decomposition of the substrate itself that was thermally damaged by high-temperature vapor deposition

Method used

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  • Method for producing antireflection film, antireflection film, polarizing plate, and image display device
  • Method for producing antireflection film, antireflection film, polarizing plate, and image display device

Examples

Experimental program
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preparation example Construction

[0055] (Preparation of composition for forming low refractive index layer)

[0056] The composition for forming a low refractive index layer is obtained by homogeneously mixing the fluorine-containing compound, fine particles, binder resin, and preferably used fluorine-containing polymer or various additives described later, and dissolving it in a solvent if necessary. while preparing.

[0057] The composition for forming a low refractive index is preferably liquid dissolved in a solvent in consideration of productivity. The viscosity of the liquid low-refractive index layer-forming composition is not particularly limited as long as a coating film can be formed on the surface of the transparent substrate by the coating method described later.

[0058] (formation of coating film)

[0059] The coating film is formed on the surface of the transparent base material so that the thickness after curing becomes a predetermined thickness described below. The composition for forming a...

Embodiment

[0212] Hereinafter, although an Example demonstrates this invention in detail, this invention is not limited to these Examples.

[0213] (Evaluation method)

[0214] 1. Minimum reflectance (evaluation of anti-reflection characteristics)

[0215] For the anti-reflection film obtained in each embodiment and comparative example, a black adhesive tape for preventing the back reflection of the film is pasted on the side of the transparent substrate where the low-refractive index layer is not provided, and from the surface of the low-refractive index layer, use The reflectance was measured with a spectrometer ("UV-2550 (model)": manufactured by Shimadzu Corporation) equipped with a regular reflection measuring device at 5 degrees, and the minimum value in the wavelength region of 380 to 780 nm was taken as the minimum reflectance. The smaller the minimum reflectance, the better the antireflection property of the antireflection film.

[0216] 2. Evaluation of coated surface

[021...

preparation example 1

[0248] Preparation Example 1: Preparation of Low Refractive Index Layer Forming Composition 1

[0249] The components of the following composition were mixed in the following mass ratio, and the composition 1 for low-refractive-index layer formation was prepared.

[0250] Composition 1 for forming a low refractive index layer

[0251] Pentaerythritol triacrylate (PETA): 0.10 parts by mass

[0252] Fluorinated compounds *1 : 1.23 parts by mass

[0253] Hollow Silica Particle Dispersion *2 : 6.69 parts by mass

[0254] Solid silica particle dispersion *3 : 0.74 parts by mass

[0255] Fluoropolymer *4 : 2.79 parts by mass

[0256] Fluorinated monomer *5 : 2.23 parts by mass

[0257] photopolymerization initiator *6 : 0.08 parts by mass

[0258] Methyl isobutyl ketone: 57.03 parts by mass

[0259] Propylene glycol monomethyl ether acetate: 29.1 parts by mass

[0260] *1, "X-71-1203M (trade name)": Shin-Etsu Chemical Co., Ltd., 20% by mass solution (solvent: methyl is...

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Abstract

The present invention provides a production method for the easy production of an antireflection film which has excellent antireflection properties, excellent scratch resistance, and antifouling performance and with which the occurrence of faint whitening that has thus far not been addressed is controlled, as well as an antireflection film, and a polarizing plate and image display device that use the film. The production method for producing an antireflection film involves performing, in the following order, a step (1) for forming a coating film by applying, on a transparent substrate, a composition containing at least a fluorine-containing compound, microparticles, and a binder resin and that is for forming a low-refractive-index layer, a step (2) for phase separation of the coating film into a low-refractive-index phase and an antifouling phase, and a step (3) for forming a low-refractive-index layer and an antifouling layer for covering the entire surface of the low-refractive-index layer by heating the low-refractive-index phase and the antifouling phase, or by exposing the low-refractive-index phase and the antifouling phase to ionizing radiation. In the production method, at least a transparent substrate, a low-refractive-index layer, and an antifouling layer are formed in that order, and the fluorine atom / carbon atom ratio measured by X-ray photoelectron spectroscopy (XPS) from the antifouling layer side is between 0.6 and 1.0, the silicon atom / carbon atom ratio is less than 0.25, and the average surface roughness of the antifouling layer (Ra') is 10 nm or less.

Description

technical field [0001] The present invention relates to a method for producing an antireflection film, an antireflection film, a polarizing plate, and an image display device. Background technique [0002] Conventionally, on the surface of displays such as liquid crystal displays (LCDs), plasma display panels (PDPs), and cathode tube display devices (CRTs), in order to impart high surface hardness or to prevent reflections of light from external light sources such as incandescent lamps and fluorescent lamps, Anti-reflection film is provided for the anti-reflection characteristics. Generally, an antireflection film is a film having a structure in which a hard coat layer and a low-refractive index layer are laminated on a transparent substrate. The low-refractive index layer preferably has a lower refractive index in order to contribute to antireflection. In addition, as a method for realizing low reflectance, for example, it is known to laminate a layer having a higher refra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/11G02B5/30G02F1/1335
CPCG02F1/133528G02B1/111G02B1/11G02B5/30G02F1/1335
Inventor 筱原诚司林真理子秋山健太郎
Owner DAI NIPPON PRINTING CO LTD
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