Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Whitening allergy-resistant mask

An anti-allergic and facial mask technology, applied in allergic diseases, cosmetics, preparations for skin care, etc., can solve the problems of infrequent use, sensitivity, and few facial masks.

Inactive Publication Date: 2014-04-30
王鹏宇
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in order to prevent bacterial contamination in this type of mask, a relatively large amount of preservatives will be added, and preservatives will penetrate into the skin more easily due to the effect of promoting penetration, causing sensitive problems
Therefore, even if the preservative content in the mask meets the standard, allergic skin should be used with caution, let alone frequent use
There are also some anti-allergic facial masks, but there are still relatively few facial masks with anti-allergic and whitening effects.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0008] Raw material content: chamomile extract 5%, hawthorn extract 1%, pearl powder 10%, polyethylene glycol 3%, glycerin 1%, honey 10% and water.

[0009] How to use: Stir the raw materials evenly to make a soft film mask.

Embodiment 2

[0011] Raw material content: chamomile extract 8%, hawthorn extract 2%, pearl powder 3%, polyethylene glycol 4%, glycerin 0.5%, honey 4% and water.

[0012] How to use: After stirring the raw materials evenly, soak the non-woven mask paper to make a cloth mask.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Particle size rangeaaaaaaaaaa
Login to View More

Abstract

The invention discloses a whitening allergy-resistant mask. The whitening allergy-resistant mask comprises 1-10% of chamomile extract, 0.1-2% of haw extract, 1-10% of pearl powder, 1-4% of polyethylene glycol, 0.5-2% of glycerin, 5-20% of honey and the balance water. The whitening allergy-resistant mask has effects of resisting allergy and whitening skin.

Description

technical field [0001] The invention relates to a mask, in particular to a whitening and antiallergic mask. Background technique [0002] At present, facial masks have become an essential maintenance product for facial care. There are many whitening facial masks on the market. The materials of some new face masks seek to isolate the air as much as possible, so that the effect of dilating pores and promoting local skin heating is more obvious. If you add penetration-promoting ingredients, it can also promote the penetration of whitening and antioxidant ingredients. However, in order to prevent bacterial contamination in this type of mask, a relatively large amount of preservatives will be added, and the preservatives will more easily penetrate into the skin due to the penetration-promoting effect, causing sensitive problems. Therefore, even if the preservative content in the mask meets the standard, allergic skin should be used with caution, let alone frequent use. There ar...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/98A61K8/97A61Q19/00A61Q19/02A61P37/08
Inventor 王鹏宇
Owner 王鹏宇
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com