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Tray assembly and MOCVD equipment with the same

A tray and component technology, applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of easy cracking of central keyed trays under thermal stress, turbulent flow of trays, and unstable central support structure, etc., to achieve Not easy to be cracked by heat, stable rotation, and cost-saving effect

Active Publication Date: 2014-02-19
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The pallets in the prior art are centrally supported, which has the disadvantages that the central support structure is not stable, the centrally bonded pallet is prone to cracking due to thermal stress, and the central airflow is cut when the core support ring and key rotate, which is easy to form turbulent flow on the pallet

Method used

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  • Tray assembly and MOCVD equipment with the same
  • Tray assembly and MOCVD equipment with the same
  • Tray assembly and MOCVD equipment with the same

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Embodiment Construction

[0028] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0029] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "upper", "lower", "front", "rear", "left", "right", " The orientations or positional relationships indicated by "vertical", "horizontal", "top", "bottom", "inner", "outer", etc. are based on the orientation or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying Describes, but does not indicate or imply that the device or element referred...

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PUM

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Abstract

The invention provides a tray assembly, which includes a rotary bracket and multiple layers of trays. The multiple layers of trays are vertically arranged at intervals; the lowest layer of tray is arranged on the bracket; an upper tray and a lower tray in two adjacent layers of trays are connected by a support assembly; and the support assembly is adjacent to the edge of the trays. According to the tray assembly in the embodiment of the invention, a bracket is employed to support multiple layers of trays, so that multiple layers of trays are more stably during rotation; and the two adjacent layers of trays in the multiple layers of trays are connected by the edge support assemblies, so as to not block or cut an central intake airflow, facilitate the formation of stable laminar flow of central intake airflow on the surfaces of the trays and improve process effect. The invention also provides MOCVD (Metal Organic Chemical Vapor Deposition) equipment with the above tray assembly.

Description

technical field [0001] The invention relates to a tray assembly and MOCVD equipment with the same. Background technique [0002] MOCVD (Metal Organic Chemical Vapor Deposition) technology is the main method for growing thin-layer single crystals of III-V, II-VI compounds and alloys. It has the advantages of precise control of component layer thickness interfaces, low maintenance costs, Large-scale industrial production and other advantages have gradually become the main mass production technology for optoelectronic materials such as gallium arsenide, indium phosphide, and gallium nitride. As the main process equipment of the above-mentioned optoelectronic materials, the depreciation cost and use cost of MOCVD equipment occupy a high share of the cost of optoelectronic materials. [0003] At present, the mainstream technical route to increase MOCVD production capacity is to increase automation, that is, to use manipulators to pick and place substrates at higher temperatures....

Claims

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Application Information

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IPC IPC(8): C23C16/458
Inventor 党志泉
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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