Preparation method of trimethylsilyl trifluoromethanesulfonate
A technology of trifluoromethanesulfonate and trifluoromethanesulfonic acid is applied in the field of preparation of trimethylsilyl trifluoromethanesulfonate, and can solve the problem of difficulty in purification and separation of trimethylsilyl trifluoromethanesulfonate, excessive silane Base reagents, increase the preparation cost and other problems, to achieve the effect of low cost, high product purity and high yield
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0008] Example 1: Add 1 mole of trifluoromethanesulfonic acid and 1 mole of trimethylchlorosilane into a reaction vessel, stir and react for 12 hours under the protection of argon, and the reaction temperature is 20 ° C. After the reaction, distill under reduced pressure for 1- After 2 hours, the fraction at 130°C was collected, the product yield was 96.5%, and the product purity was 99.4%.
Embodiment 2
[0009] Example 2: Add 1 mole of trifluoromethanesulfonic acid and 1.5 moles of trimethylchlorosilane into a reaction vessel, stir and react for 12 hours under the protection of argon, and the reaction temperature is 20 ° C. After the reaction, distill under reduced pressure for 1- After 2 hours, the fraction at 130°C was collected, the product yield was 97.8%, and the product purity was 99.9%.
Embodiment 3
[0010] Example 3: Add 1 mole of trifluoromethanesulfonic acid and 1 mole of trimethylchlorosilane into a reaction vessel, stir and react for 12 hours under nitrogen protection, and the reaction temperature is 10°C. After the reaction, distill under reduced pressure for 1-2 hours , collect 130 ℃ fraction, product yield is 95.1%, and product purity is 98.7%.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com