Inspection system for use with scanning electron microscope

Abstract

An inspection system using a scanning electron microscope includes a scanning electron microscope chamber inspecting an object to be inspected by using an electron beam and maintaining a vacuum condition, a stage positioned below the scanning electron microscope chamber to be separated therefrom and mounted with the object to be inspected, and a transverse guide transferring the scanning electron microscope chamber on the stage. Atmospheric conditions are maintained between the scanning electron microscope chamber and the object to be inspected. Accordingly, object to be inspected a large size of an object to be inspected may be inspected without damage to the object to be inspected such that a cost reduction and a yield improvement may be realized.

Description

technical field [0001] The present invention generally relates to an inspection system using a scanning electron microscope, and more particularly, to an inspection system using a scanning electron microscope to perform inspection of an object under atmospheric conditions without limiting the size of the object. Background technique [0002] Generally, flat panel display devices such as liquid crystal display (LCD) devices and organic light emitting diode (OLED) display devices are formed by depositing a plurality of thin films and wires on a substrate. In order to inspect the presence of defects such as impurities or particles on the film of the flat panel display device or to inspect short circuits between electric wires, an inspection system configured with a scanning electron microscope (SEM) is used. [0003] A vacuum scanning electron microscope may be used in the inspection system. The size of samples observed by contemporary SEMs is limited by the size of the vacuum...

AI Technical Summary

Problems solved by technology

The size of the sample observed by the contemporary SEM is limited by the size of the vacuum chamber of the SEM

Vacuum scanning electron microscopes have been developed capable of observing semiconductor wafers made up to a width of 30 inches; however, due to the size limitation of the vacuum chamber of the SEM, inspections such as flat panel display devices with dimensions ranging from 730mm×920mm to 2200mm×2500mm etc., it is difficult to use such a vacuum scanning electron microscope

[0004] When the size of the vacuum chamber is increased to be able to accommodate flat panel display devices, artifacts such as secondary electrons (SE) or backscattered electrons (BSE), which are objects to be inspected and already located in the vacuum chamber, are generated by the Adverse effects of interference caused by the charge effect of the vacuum chamber, making it difficult to observe the image of the object to be inspected, and carbon contamination by hydrocarbon compounds (HxCx) can occur due to the pump used in the vacuum chamber

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