Beam splitting device and multi-beam interference light path system

Abstract

The invention discloses a beam splitting device and a multi-beam interference light path system. The beam splitting device comprises a light blocking mother board, multiple round holes formed in the light blocking mother board, and multiple beam splitting lenses positioned in the multiple round holes. The multiple beams are split through the multiple beam splitting lenses, and the beam splitting device has the advantages of simple principle and adjustable beam splitting effect; and moreover, the generated beam splitting light path is not required to be adjusted by employing multiple branches, so that the multi-beam interference light path system is simple and compact in overall structure and brings novel application prospects to multi-beam interference exposure.

Description

technical field [0001] The invention relates to an interference optical path system capable of making photonic crystals, especially an optical path system capable of three-beam or even multi-beam interference, and the interference angle is continuously adjustable. It involves the fields of micro-nano manufacturing and optical design. Background technique [0002] Photonic Crystal was independently proposed by S.john and E.Yablonovitch in 1987. It is an artificial microstructure formed by periodic arrangement of media with different refractive indices. Among the technologies used to manufacture high-power blue LEDs, the method of using photonic crystals to improve the luminous efficiency of LEDs is being increasingly proposed. The result of making photonic crystals on sapphire substrates can not only improve the external quantum efficiency of LEDs, but also effectively improve the lattice mismatch problem of GaN grown on sapphire substrates, such as the work of Y.K.Su et al....

AI Technical Summary

Problems solved by technology

Electron beam direct writing is not suitable for large-area production of photonic crystal structures due to expensive equipment and low efficiency; high-end miniature projection exposure machine equipment is also very expensive, and the production investment is relatively large; nanoimprint technology is still immature, and large-area It is difficult to make a photonic crystal structure; holographic exposure technology can produce a photonic crystal structure in a large area, at low cost, and relatively quickly

[0004] In the holographic interference exposure technology, if it is necessary to obtain a photonic crystal with a two-dimensional structure at one time, three beams or multi-beam interference exposure is required. The traditional method of splitting light through mirrors and semi-transparent mirrors is used to obtain multi-beam interference exposure. The optical path Very complex, and the optical path is large and not compact

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