Surface patterning high-strength and high-toughness hybrid hydrogel membrane and preparation method thereof
A technology of surface patterning and hybrid gel, applied in the field of functional materials and biomaterials, can solve the problems such as difficult to control uniform thickness of hydrogel film, low strength and toughness of hydrogel, difficult surface patterning of hydrogel, etc. To achieve the effect of good application prospect, low cost, simple preparation method and process
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Embodiment 1
[0019] Example 1. A high-strength and high-toughness gel film patterned with narrow straight stripes on the surface and its preparation method
[0020] a) successively wash the silicon wafer patterned with narrow straight stripes with dilute hydrochloric acid, absolute ethanol and deionized water, and then vacuum-dry at 60° C. for 24 hours to obtain a dried patterned silicon wafer;
[0021] b) Weigh 15g of isopropylacrylamide, 0.5g of sodium alginate, and ethylene glycol dimethacrylate with a mass percentage of 0.03% of isopropylacrylamide, dissolve them in 100ml of deionized water together, stir to dissolve evenly, and then add The strengthening agent nano-hydroxyapatite with 1% by mass of isopropylacrylamide is uniformly dispersed by ultrasonic, and then ammonium persulfate with 5% by mass of isopropylacrylamide and sulfurous acid with 5% by mass of isopropylacrylamide are added Sodium hydrogen and tetramethylethylenediamine with a mass percentage of 0.01% isopropylacrylamid...
Embodiment 2
[0023] Example 2. A wide vertical stripe patterned high-strength and high-toughness gel film and its preparation method
[0024] a) Washing the silicon wafer patterned with wide vertical stripes with dilute hydrochloric acid, absolute ethanol and deionized water successively, and then drying in vacuum at 80° C. for 8 hours to obtain a silicon wafer patterned with wide vertical stripes after drying;
[0025]b) Weigh 5g of diacetone acrylamide, 2g of sodium alginate, and divinylbenzene with a mass percentage of 0.15% of diacetone acrylamide, dissolve them in 50ml of deionized water, stir and dissolve evenly, and then add 200% of diacetone acrylamide by mass % of reinforcing agent nano-silica, after ultrasonic dispersion is uniform, add diacetone acrylamide mass percentage 5% ammonium persulfate, diacetone acrylamide mass percentage 5% sodium bisulfite and diacetone acrylamide mass percentage 0.1% After stirring and dispersing evenly, pour the solution into the patterned silicon ...
Embodiment 3
[0027] Example 3. A cylindrical surface patterned high-strength and high-toughness gel film and its preparation method
[0028] a) successively washing the cylindrical patterned silicon wafer with dilute hydrochloric acid, absolute ethanol and deionized water, and then vacuum drying at 80° C. for 8 hours to obtain a dried patterned silicon wafer;
[0029] b) Weigh 15g of acrylamide, 0.5g of sodium alginate, and ethylene glycol dimethacrylate with a mass percentage of 0.03% of acrylamide, dissolve them together in 100ml of deionized water, stir to dissolve evenly, and then add 1% of acrylamide by mass The strengthening agent nano-titanium dioxide, after ultrasonic dispersion, add ammonium persulfate of 0.1% by mass of acrylamide, sodium bisulfite of 0.1% by mass of acrylamide and tetramethylethylenediamine of 0.01% by mass of acrylamide, and stir After the dispersion is uniform, immediately pour the solution into the patterned silicon wafer treated in step a), scrape it with a ...
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